首页> 外国专利> CHANGE INFLUENCE ANALYSIS DEVICE, CHANGE INFLUENCE ANALYSIS SYSTEM, AND CHANGE INFLUENCE ANALYSIS METHOD

CHANGE INFLUENCE ANALYSIS DEVICE, CHANGE INFLUENCE ANALYSIS SYSTEM, AND CHANGE INFLUENCE ANALYSIS METHOD

机译:改变影响分析装置,改变影响分析系统,改变影响分析方法

摘要

The purpose of the present invention is to provide a technology for accurately specifying the range of influence of changes in software, even when a clone code is present in the software. A change influence analysis device (11) according to the present invention comprises: a specification dependency model construction unit (20) which generates a specification dependency model (50) representing the dependency of specifications, on the basis of modified specification sheets (41, 42) in which change requests in past development and current development of software, modified specifications described in natural language, and source codes of the modified specifications are described in association with each other; and a change influence range specifying unit (30) which specifies a change influence range that is the range of a software source code affected by the change, on the basis of a source code dependency (60) which shows the source code dependency, of the software, obtained by the analysis using a static analysis model, and a specification dependency model (50), when a part of the software source code is changed.
机译:本发明的目的是提供一种用于准确地指定软件变化的影响范围的技术,即使软件中存在克隆代码。根据本发明的改变影响分析装置(11)包括:规范依赖模型结构单元(20),其基于修改的规格纸张(41,42,产生表示规格依赖性的规范依赖性模型(50)(41,42 )在过去的开发和当前开发的改变请求,在自然语言中描述的修改规范以及修改规范的源代码彼此相关联;和一个改变影响范围指定单元(30),它指定一个改变影响范围,即基于显示源代码依赖关系的源代码依赖关系(60),该改变影响范围是受变化影响的软件源代码的范围通过使用静态分析模型的分析获得的软件,以及调整软件源代码的一部分的规范依赖模型(50)。

著录项

  • 公开/公告号WO2021053783A1

    专利类型

  • 公开/公告日2021-03-25

    原文格式PDF

  • 申请/专利权人 MITSUBISHI ELECTRIC CORPORATION;

    申请/专利号WO2019JP36699

  • 发明设计人 SHIRAKAWA TOMOYA;

    申请日2019-09-19

  • 分类号G06F8/75;

  • 国家 JP

  • 入库时间 2022-08-24 17:56:50

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