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Measuring instrument, major measure and manufacturing method

机译:测量仪器,重大措施和制造方法

摘要

Problem to be solved: to provide a measuring instrument and a measure in which the width of the measure can be made smaller.Measuring instrument 1 isFrom a major 7a having a color pattern including a plurality of patterns arranged at regular intervals in the length directionA plurality of patterns 8 and a plurality of light emitting portions 8 and a light receiving portion 9 which are optically read and arranged in a predetermined distance in a length directionConverts the pattern read by the plurality of light receiving sections 9 into a value of n (greater than or equal to 3) and converts them toBased on the data that defines the relationship between the value of the nth and the scale of the measureA microcomputer 3 for calculating a scale value of a measure is provided.Diagram
机译:要解决的问题:提供测量仪器和测量的测量,其中可以更小。测量仪器1是具有彩色图案的主要7a,其包括在长度方向上的长度方向8和多个发光部分8和光接收部分9处以规则间隔布置的多个图案,以及光学读取和布置在a中长度方向上的预定距离将由多个光接收部分9读取的图案进入n(大于或等于3)的值,并将其转换为在定义第n个和比例之间的关系的数据上。提供用于计算测量的尺度值的测量微型计算机3 .diagram

著录项

  • 公开/公告号JP2021096235A

    专利类型

  • 公开/公告日2021-06-24

    原文格式PDF

  • 申请/专利权人 富士通コンポーネント株式会社;

    申请/专利号JP20200189632

  • 发明设计人 石橋 一典;

    申请日2020-11-13

  • 分类号G01B3/02;G01B11;

  • 国家 JP

  • 入库时间 2022-08-24 19:35:26

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