首页> 外国专利> PROCESS FOR PRODUCING, BY ETCHING THROUGH A LENTICULAR GRATING, IMAGES THAT MAY BE SELECTIVELY VIEWED BY VARYING ANGLE OF OBSERVATION

PROCESS FOR PRODUCING, BY ETCHING THROUGH A LENTICULAR GRATING, IMAGES THAT MAY BE SELECTIVELY VIEWED BY VARYING ANGLE OF OBSERVATION

机译:通过蚀刻通过透镜状光栅,通过不同观察角度选择性地观察的图像来制造方法

摘要

Disclosed is a process for producing, under a lenticular grating, in an etching zone, by laser etching, using a tool, a first image and at least one second image that may be selectively viewed by varying angle of observation, the tool including a laser, a galvanometric head and a lens, and defining an optical axis and a working zone and the process including the following steps: placing the etching zone in a first location included in the working zone and on the periphery of the working zone, and, perpendicularly to the optical axis, etching the first image; and then placing the etching zone in a second location, which is different from the first location, included in the working zone and on the periphery of the working zone, and, perpendicularly to the optical axis, etching the second image.
机译:公开了通过使用工具,第一图像和至少一个第二图像在蚀刻区在蚀刻区中制造在蚀刻区的过程中,该工具可以通过不同的观察角度选择地选择性地观察,该工具包括激光器 ,电流磁头和透镜,并限定光轴和工作区,包括以下步骤的过程:将蚀刻区域放置在工作区中包括的第一位置和工作区的周边,垂直 到光轴,蚀刻第一图像; 然后将蚀刻区域放置在第二位置,该第二位置不同于工作区中的第一位置和工作区的周边,并且垂直于光轴,蚀刻第二图像。

著录项

  • 公开/公告号EP3393820B1

    专利类型

  • 公开/公告日2021-09-22

    原文格式PDF

  • 申请/专利权人 IDEMIA FRANCE;

    申请/专利号EP20160829267

  • 申请日2016-12-21

  • 分类号B42D25/41;B42D25/324;B41M5/24;B44C1/22;B44F1/10;B41M3/14;B41M5/26;

  • 国家 EP

  • 入库时间 2022-08-24 21:11:46

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