Reflective optical element for oblique incidence in the EUV wavelength range

• 1. 用于EUV波长范围的反射光学元件、制造和校正这种元件的方法、包括这种元件的微光刻的投射镜头及包括这种投射镜头的微光刻的投射曝光设备 [P] . 中国专利： CN103858055A . 2014-06-11
• 2. EUV反射镜布置、包括EUV反射镜布置的光学系统以及操作包括EUV反射镜布置的光学系统的方法 [P] . 中国专利： CN103443863B . 2017.03.08
• 3. Reflective optical element for oblique incidence in the EUV wavelength range [P] . 欧洲知识产权局专利： EP2824487A1 . 2015-01-14

  机译： 在EUV波长范围内倾斜入射的反射光学元件

• 4. METHOD FOR PRODUCING REFLECTIVE OPTICAL ELEMENTS FOR THE EUV WAVELENGTH RANGE, AND REFLECTIVE OPTICAL ELEMENTS FOR THE EUV WAVELENGTH RANGE [P] . WO2021224353A1 . 2021-11-11

  机译： 用于为EUV波长范围的反射光学元件的制造方法，以及用于EUV波长范围的反射光学元件

• 5. Procedure for the production of reflective optical elements for the wavelength range of EUV and reflective optical elements for the wavelength range of EUV [P] . DE102020205788A1 . 2021-11-11

  机译： 用于生产用于EUV波长范围的EUV波长范围的反射光学元件的过程，用于EUV的波长范围

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