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METHOD FOR PRODUCING REFLECTIVE OPTICAL ELEMENTS FOR THE EUV WAVELENGTH RANGE, AND REFLECTIVE OPTICAL ELEMENTS FOR THE EUV WAVELENGTH RANGE
METHOD FOR PRODUCING REFLECTIVE OPTICAL ELEMENTS FOR THE EUV WAVELENGTH RANGE, AND REFLECTIVE OPTICAL ELEMENTS FOR THE EUV WAVELENGTH RANGE
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机译：用于为EUV波长范围的反射光学元件的制造方法，以及用于EUV波长范围的反射光学元件
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摘要
In particular for producing reflective optical elements for the EUV wavelength range, which have grating structures or which can serve for a phase shift, methods with the following steps are proposed: - applying a structurable layer to a substrate, and either – applying a reflecting coating to the substrate that has been provided with a structurable layer, and – locally irradiating the structurable layer under the reflecting coating, or – locally irradiating the structurable layer and – applying a reflecting coating to the structurable layer, wherein at least two plies of in each case a different material are applied as structurable layer and the materials exothermically mix and/or exothermically react with one another under the influence of the irradiation. Reflective optical elements (50) for the EUV wavelength range, inter alia those produced in this way, comprise a substrate (59) and a reflecting coating (54), wherein a structurable layer (60) is arranged between the substrate (59) and the reflecting coating (54).
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