NEW OPTIMIZATION OF CD CONTROL FOR GLOBAL AND LOCALIZED PROFILE PERFORMANCE

机译：全局和局部配置文件性能的CD控制的新优化

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Achieving a uniform profile is the goal of every cross direction (CD) control application. A critical factor to reachrnthat goal is the accurate spatial alignment of CD actuators with their corresponding responses on the measuredrnprofile. In a typical process, the actual CD alignment often changes with process conditions. As a result, profilesrndegrade either locally or globally if CD actuators are misaligned with their measured profiles in a CD control. Arnnew technique for quickly detecting profile degradation and effectively optimizing CD control is presented. Thernresult of this new optimization technique is demonstrated with the result obtained from a mill application.

机译：实现统一的轮廓是每个横向（CD）控制应用程序的目标。达到该目标的关键因素是CD执行器的精确空间对准及其在测量轮廓上的相应响应。在典型的过程中，实际CD对齐通常会随过程条件而变化。结果，如果CD执行器与CD控件中的测量轮廓未对齐，则轮廓会局部或全局降级。提出了一种Arnnew技术，用于快速检测轮廓退化并有效优化CD控制。从工厂应用获得的结果证明了这种新的优化技术的结果。

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来源
《2003 TAPPI spring technical conference and exhibit》|2003年|p.1-10|共10页
会议地点 Chicago IL(US)
作者
Tim Mast; Kevin Starr; Pete Tran; Shih-Chin Chen;
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作者单位

ABB Inc.650 Ackerman RoadColumbus, OH 43202;

ABB Inc.650 Ackerman RoadColumbus, OH 43202;

ABB Inc.650 Ackerman RoadColumbus, OH 43202;

ABB Inc.650 Ackerman RoadColumbus, OH 43202;

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原文格式 PDF
正文语种 eng
中图分类造纸工业;工业设计;
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NEW OPTIMIZATION OF CD CONTROL FOR GLOBAL AND LOCALIZED PROFILE PERFORMANCE

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