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3D Simulation of Triple-Gate MOSFETs

机译:三栅极MOSFET的3D模拟

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摘要

In this paper we present a new approach of analyzing 3D structure for Triple-Gate MOSFETs with three different mesh regions, one at the top and two in the sidewalls of the fin, which allows the consideration of different carrier mobility at each region due to the crystalline orientation and technological processing. A procedure for the extraction of the mobility parameters in each region is developed. Validation of the proposed structure was made for a FinFET arrays with fixed channel length and different fin widths, obtaining a very good coincidence between experimental and simulated characteristics.
机译:在本文中,我们提出了一种新的分析三栅极MOSFET的3D结构的新方法,该MOSFET具有三个不同的网格区域,一个在顶部,另一个在鳍的侧壁中,两个网格区域考虑了由于结晶取向和工艺加工。开发了用于提取每个区域中的迁移率参数的过程。对于具有固定沟道长度和不同鳍宽度的FinFET阵列,对提出的结构进行了验证,从而在实验和仿真特性之间获得了很好的一致性。

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