Dept. of Electr. Eng., Chulalongkorn Univ., Bangkok, Thailand;
III-V semiconductors; atomic force microscopy; crystallisation; drops; gallium compounds; liquid phase epitaxial growth; molecular beam epitaxial growth; reflection high energy electron diffraction; semiconductor growth; semiconductor quantum dots; (001) substrates; GaAs; GaSb; antimony flux; atomic force microscopy; crystallization; droplet epitaxy technique; liquid droplets; quantum dots; quantum rings; reflection high energy electron diffraction; solid-source molecular beam epitaxy; Crystallization; Gallium arsenid;
机译:AlGaAs / GaAs / Algaas井中GASB量子环的线性和非线性光学性能的操纵,ALAS / GAAS / INGAAS / ALAS双量子阱
机译:GaAs / Al_(0.6)Ga_(0.4)As量子阱中GaSb量子环中载流子的电子和光学性质
机译:GaAs / Al_xGa_(1-x)As量子阱中的GaSb量子环
机译:GA液滴进入GASB量子环的演变
机译:基于GaSb的I型量子阱可调谐二极管激光器,光谱范围超过3微米
机译:在InP(100)衬底上生长的GaSb / InGaAs II型量子点的结构和光学性质
机译:GaAs / AlxGa1-xAs量子阱中的GaSb量子环
机译:Gasb / Inas / Gasb量子阱中共存电子和空穴的密度和迁移率