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Analysis of bulk and accumulation mobilities in n- and p-type triple gate junctionless nanowire transistors

机译:n型和p型三栅极无结纳米线晶体管的体积和累积迁移率分析

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摘要

This paper studies the effective mobility in n- and p-type junctionless nanowire transistors (JNT) with variable fin width from quasi-planar to nanowire devices. JNTs electrical parameters were analyzed and the results show that smaller fin width have higher mobility while the mobility decreases for quasi-planar devices. Simulations were used to analyze the mobility showing that small fin devices reach higher mobility for smaller gate bias variation above the threshold voltage and a higher mobility in the middle of the channel due to the better electrostatic coupling compared to larger devices.
机译:本文研究了从准平面器件到纳米线器件的可变鳍宽的n型和p型无结纳米线晶体管(JNT)的有效迁移率。分析了JNTs的电参数,结果表明,对于准平面器件,较小的鳍片宽度具有较高的迁移率,而迁移率则降低。通过仿真分析迁移率,结果表明,与较大型器件相比,由于静电耦合更好,小型鳍片器件在阈值电压以上时,栅极偏置变化较小时,鳍片器件的迁移率更高;而在沟道中间,则迁移率较高。

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