Grating phase-mask lithography for subwavelength radial polarizer fabrication

机译：用于亚波长径向偏振片制造的光栅相位掩模光刻

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The grating manufacturing technology using a phase-mask is here expanded to the fabrication of circularly symmetrical gratings of radial periodicity with exposure by means of an incident beam of azimuthal polarization. The application example is a radial polarizer for the 442 nm line of a HeCd laser.

机译：使用相位掩模的光栅制造技术在此扩展为通过方位偏振的入射光束进行曝光的径向周期性的圆形对称光栅的制造。应用示例是用于HeCd激光器的442 nm线的径向偏振器。

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来源
《2nd EOS conference on manufacturing of optical components 2011》|2011年|p.58-59|共2页
会议地点 Munich(DE);Munich(DE)
作者
Y. Jourlin; C. Veillas; S. Tonchev; J. Sauvage-Vincent; U. Zeitner; O. Parriaux;
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University of Lyon, Lab. H. Curien UMR CNRS 5516, Saint-Etienne, 42000, France;

University of Lyon, Lab. H. Curien UMR CNRS 5516, Saint-Etienne, 42000, France;

University of Lyon, Lab. H. Curien UMR CNRS 5516, Saint-Etienne, 42000, France,on leave from the ISSP Bulgarian Academic of Science, Sofia, 1784, Bulgaria;

University of Lyon, Lab. H. Curien UMR CNRS 5516, Saint-Etienne, 42000, France;

Fraunhofer Institut fuer Angewandte Optik und Feinmechanik IOF,07745 Jena, Germany;

University of Lyon, Lab. H. Curien UMR CNRS 5516, Saint-Etienne, 42000, France;

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中图分类光学仪器;
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机译：用于亚波长径向偏振器制造的光栅相位掩模光刻
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Grating phase-mask lithography for subwavelength radial polarizer fabrication

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