3D Electron beam lithography in for μ- and n-optics

机译：适用于μ光学和n光学的3D电子束光刻

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The paper presents fabrication techniques based on 3D electron beam lithography (EBL) in mono or multi-layer resists, for fabrication of 3D nanostructures with feature size in the sub-micron range, for micro and nano-optics.

机译：本文介绍了在单层或多层抗蚀剂中基于3D电子束光刻（EBL）的制造技术，用于制造特征尺寸在亚微米范围内的3D纳米结构，用于微米和纳米光学。

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来源
《2nd EOS conference on manufacturing of optical components 2011》|2011年|p.115-116|共2页
会议地点 Munich(DE);Munich(DE)
作者
Dana Cristea; Adrian Dinescu; Paula Obreja; Roxana Rebigan;
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National Institute for RD in Microtechnologies (IMT-Bucharest) PO Box 38-160, Bucharest 023573, Romania;

National Institute for RD in Microtechnologies (IMT-Bucharest) PO Box 38-160, Bucharest 023573, Romania;

National Institute for RD in Microtechnologies (IMT-Bucharest) PO Box 38-160, Bucharest 023573, Romania;

National Institute for RD in Microtechnologies (IMT-Bucharest) PO Box 38-160, Bucharest 023573, Romania;

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正文语种 eng
中图分类光学仪器;
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4. 3D Electron beam lithography in for μ- and n-optics [C] . Dana Cristea, Adrian Dinescu, Paula Obreja, EOS conference on manufacturing of optical components . 2011

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3D Electron beam lithography in for μ- and n-optics

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