首页> 外国专利> ELECTRON BEAM LITHOGRAPHY APPARATUS, DEFLECTION AMPLIFIER, ELECTRON BEAM LITHOGRAPHY METHOD, MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE AND ELECTRON BEAM LITHOGRAPHY PROGRAM

ELECTRON BEAM LITHOGRAPHY APPARATUS, DEFLECTION AMPLIFIER, ELECTRON BEAM LITHOGRAPHY METHOD, MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE AND ELECTRON BEAM LITHOGRAPHY PROGRAM

机译：电子束光刻设备，偏转放大器，电子束光刻方法，半导体装置的制造方法以及电子束光刻程序

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摘要

PROBLEM TO BE SOLVED: To provide an electron beam lithography apparatus which can compensate the drawing position with high accuracy, a deflection amplifier, an electron beam lithography method, a method for manufacturing a semiconductor device, and an electron beam lithography program.;SOLUTION: The electron beam drawer is provided with at least one step of deflection amplifier and deflector (5, 9), a first storage means (31) for storing the number of shots at drawing, a second storage means 32 which stores a compensation table, showing the relation between the number of shots and the output voltage of the deflection amplifier, the compensating table stored in the second storage means, and adjustment means (33, 34) which adjusts the output of the deflection amplifier based on the number of shots stored in the first storage means.;COPYRIGHT: (C)2006,JPO&NCIPI

机译：解决的问题：提供一种可以高精度地补偿绘制位置的电子束光刻设备，偏转放大器，电子束光刻方法，半导体器件的制造方法以及电子束光刻程序。电子束抽屉设有至少一个偏转放大器和偏转器（5、9）的台阶，用于存储画图时的射击次数的第一存储装置（31），用于存储补偿表的第二存储装置32，示出了发射数量与偏转放大器的输出电压之间的关系，存储在第二存储装置中的补偿表，以及调节装置（33、34），其根据存储在第二发射装置中的发射数量来调节偏转放大器的输出。第一种存储方式。版权所有：（C）2006，JPO＆NCIPI

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公开/公告号JP2006135260A

专利类型
公开/公告日2006-05-25

原文格式PDF
申请/专利权人 TOSHIBA CORP;
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申请/专利号JP20040325503
发明设计人 KOSHIBA TAKESHI;TAWARAYAMA KAZUO;OTA TAKUMI;TOUKI TATSUHIKO;MIZUNO HISAYUKI;UMAGOE TOSHIYUKI;NAKASUGI TETSUO;SASAKI NORIAKI;
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申请日2004-11-09
分类号H01L21/027;G03F7/20;H01J37/147;H01J37/20;H01J37/305;
国家 JP
入库时间 2022-08-21 21:54:14

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