首页> 外文会议>2nd International EUSPEN Conference on Precision Engineering Nanotechnology Vol.1, May 27th-31st, 2001, Turin, Italy >A combined x-ray interferometer and scanning tunnelling microscope for the characterization of grating structures
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A combined x-ray interferometer and scanning tunnelling microscope for the characterization of grating structures

机译:结合X射线干涉仪和扫描隧道显微镜对光栅结构进行表征

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A monolithic x-ray interferometer and a scanning tunnelling microscope (STM) have been combined as one instrument and used to calibrate grating structures with periodicities of 100 nm or less. The x-ray interferometer is used as a translation stage which moves in discreet steps of 0.192 nm, the lattice spacing of the silicon (220) planes. Hence movements are traceable to the definition of the metre and are free from the non-linearity associated with optical interferometers used to measure displacement in more conventional metrological scanning probe microscopes (MSPMs).
机译:整体式X射线干涉仪和扫描隧道显微镜(STM)已被组合为一种仪器,并用于校准周期为100 nm或更小的光栅结构。 X射线干涉仪用作平移台,以0.192 nm(硅(220)平面的晶格间距)的离散步长移动。因此,运动可追溯到仪表的定义,并且没有与光学干涉仪相关的非线性,光学干涉仪用于在更传统的计量扫描探针显微镜(MSPM)中测量位移。

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