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首页> 外文会议>7th International Conference on Electromagnetic Processing of Materials >Influence of high magnetic field annealing on microstructure of pulse-electrodeposited nanocrystalline Co-Ni-P films
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Influence of high magnetic field annealing on microstructure of pulse-electrodeposited nanocrystalline Co-Ni-P films

机译：强磁场退火对脉冲电沉积纳米Co-Ni-P薄膜的微观结构的影响

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摘要

The effects of high magnetic field annealing on the morphology and texture of pulsed-electrodeposited Co-Ni-P films were investigated by field emission scanning electronic microscopy(FE-SEM),atomic force microscopy(AFM)and X-ray diffraction(XRD).The as-deposited film with cluster structural on a rough surface changed into non-uniform and bigger nanocrystalline during the no-field annealing due to a recrystallization process.Post-deposition annealing under a magnetic field favored to form a more homogeneous surface with smaller grain size and lower roughness.The magneto-induced a mixed phase structure including fcc-Ni,hcp-Co and fcc-CoNiP appeared in the case of the films annealed at a 9T magnetic field.The possible overlapping effects such as diffusion and recrystallization obtained by the magnetic field annealing on the morphology evolution and on the phase transformation in the films were interpreted.
机译：通过场发射扫描电子显微镜（FE-SEM），原子力显微镜（AFM）和X射线衍射（XRD）研究了强磁场退火对脉冲电沉积Co-Ni-P薄膜的形貌和织构的影响。由于重结晶过程，在无场退火过程中，在粗糙表面上具有簇结构的沉积膜变为不均匀且较大的纳米晶体。在磁场下进行后沉积退火有助于形成更均匀的表面，且表面较小在9T磁场下退火的情况下，出现了磁感应的包括fcc-Ni，hcp-Co和fcc-CoNiP的混合相结构，获得了可能的重叠效应，如扩散和重结晶通过磁场退火对薄膜的形貌演化和相变进行了解释。

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