Improvement of Slit Photolithography Process Reliability for Four-Mask Fabrication process in TFT LCDs

著录项

• 来源
  《IMID/IDMC/ASIA DISPLAY 2008;International display manufacturing conference 2008;International meeting on information display;Asia display 2008》|2008年|p.851-854|共4页
• 会议地点 Ilsan(KR);Ilsan(KR);Ilsan(KR);Ilsan(KR)
• 作者

  Tae-Yup Min; Haijun Qiu; Zhangtao Wang; Wenbao Gao; Sang-Un Choi; Sung-Kyu Lee;

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• 作者单位

  Development Team, Beijing BOE Optoelectronics Technology Co., LTD., No.8 Xihuanzhonglu, BDA, Beijing100176 86-10-6785-5688-6669 Email: tymin@boe.com.cn;

  rnDevelopment Team, Beijing BOE Optoelectronics Technology Co., LTD., No.8 Xihuanzhonglu, BDA, Beijing100176;

  rnDevelopment Team, Beijing BOE Optoelectronics Technology Co., LTD., No.8 Xihuanzhonglu, BDA, Beijing100176;

  rnDevelopment Team, Beijing BOE Optoelectronics Technology Co., LTD., No.8 Xihuanzhonglu, BDA, Beijing100176;

  rnDevelopment Team, Beijing BOE Optoelectronics Technology Co., LTD., No.8 Xihuanzhonglu, BDA, Beijing100176;

  rnDevelopment Team, Beijing BOE Optoelectronics Technology Co., LTD., No.8 Xihuanzhonglu, BDA, Beijing100176;

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• 会议组织
• 原文格式 PDF
• 正文语种 eng
• 中图分类 显示技术;显示设备、显示器;
• 关键词

  four mask process; slit mask process;

  机译：四个掩膜工艺；裂口罩工艺;