Novel Four-Mask Process in the FFS TFT-LCD with Optimum Multiple-Slit Design Applied by the use of a Gray-Tone Mask

Seungfin Choi; Jinhui Cho; Kyu-yong Han; J. H. Jang; J. G. Park; H. J. Yoon; B. N. Yoon; S. H. Ihm; Young Jin Lim

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Novel Four-Mask Process in the FFS TFT-LCD with Optimum Multiple-Slit Design Applied by the use of a Gray-Tone Mask

机译：FFS TFT-LCD中的新型四面膜工艺，采用灰色调掩模，具有最佳的多缝设计

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In order to simplify the array manufacturing process of FFS TFT-LCD, novel four-mask process which is adopted to the optimum multiple-slit design in the common electrode and contact hole has been developed. The adoption of the optimum multiple-slit design is able to support stable process margin without ripple of gray-tone. Moreover, continuous process by etching of the gate and transparent common electrode simplify array process of FFS devices.

机译：为了简化FFS TFT-LCD的阵列制造工艺，已经开发出新颖的四掩模工艺，该四掩模工艺被用于公共电极和接触孔中的最佳多缝设计。采用最佳的多缝设计能够支持稳定的工艺裕度，而不会产生灰阶波动。而且，通过蚀刻栅极和透明公共电极的连续工艺简化了FFS器件的阵列工艺。

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《SID International Symposium: Digest of Technology Papers》 |2005年第1期|共4页
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Seungfin Choi; Jinhui Cho; Kyu-yong Han; J. H. Jang; J. G. Park; H. J. Yoon; B. N. Yoon; S. H. Ihm; Young Jin Lim;
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1. Novel Four-Mask Process in the FFS TFT-LCD with Optimum Multiple-Slit Design Applied by the use of a Gray-Tone Mask [J] . Seungfin Choi, Jinhui Cho, Kyu-yong Han, SID International Symposium: Digest of Technology Papers . 2005,第1期

机译：FFS TFT-LCD中的新型四面膜工艺，采用灰色调掩模，具有最佳的多缝设计
2. A 513-ppi FFS-Mode TFT-LCD using CAAC Oxide Semiconductor Fabricated by a 6-Mask Process [J] . Akio Yamashita, Daisuke Kubota, Koji Moriya, SID International Symposium: Digest of Technology Papers . 2014,第1期

机译：使用6掩膜工艺制造的采用CAAC氧化物半导体的513ppi FFS模式TFT-LCD
3. Optimum Slit Design Simulation Applied by the Gray-tone Photolithography [J] . Seung-Jin Choi, Ki-Yong Kim, Lv Jing, SID International Symposium: Digest of Technology Papers . 2008,第3期

机译：灰度光刻技术在最佳狭缝设计仿真中的应用
4. Advanced Halftone Photolithography Using Four-Mask Process Architecture for G8.6 TFT-LCDs [C] . An-Thung Cho, Feng-yun Yang, Zhen Liu, International Conference on Display Technology;Society for Information Display . -1

机译：使用四个掩模工艺架构的高级半色调光刻，用于G8.6 TFT-LCD
5. OPTIMALITY CRITERIA APPLIED TO CERTAIN RESPONSE SURFACE DESIGNS [D] . WARDROP, DANIEL M. 1985

机译：适用于某些响应表面设计的最优标准
6. Last-resort strategies during mask shortages: optimal design features of cloth masks and decontamination of disposable masks during the COVID-19 pandemic [O] . Shovon Bhattacharjee, Prateek Bahl, Abrar Ahmad Chughtai, 2020

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7. Facilitation of the four-mask process by the double-layered Ti/Si barrier metal for oxide semiconductor TFTs [O] . Aya Hino, Takeaki Maeda, Shinya Morita, 2012

机译：通过双层Ti / Si阻挡金属用于氧化物半导体TFT的四个掩模过程的促进

Novel Four-Mask Process in the FFS TFT-LCD with Optimum Multiple-Slit Design Applied by the use of a Gray-Tone Mask

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