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首页> 外文会议>Active Photonic Crystals; Proceedings of SPIE-The International Society for Optical Engineering; vol.6640 >PbTe quantum dots multilayer for optical switching device
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PbTe quantum dots multilayer for optical switching device

机译：用于光开关器件的PbTe量子点多层

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In this work we report the fabrication of PbTe quantum dots multilayers embedded in SiO_2 by alternatively use of Laser Ablation and Plasma Enhanced Chemical Vapor Deposition techniques. The quantum dots were grown by pulsed laser deposition (PLD) of a PbTe target using the second harmonic of a Q-Switched Quantel Nd:YAG laser in high purity argon atmosphere. The glass matrix was fabricated by PECVD using tetramethoxysilane (TMOS) as precursor. The RF power was supplied by a RF-150 TOKYO Hi-Power operating at 13.56 MHz and coupled to the RF electrodes through a matching box. The deposition rates as well as the best growth parameters for both the nanoparticles and the glass matrix were obtained from a previous work. The morphological properties of the nanostructured material were studied by means of igh Resolution Transmission Electron Microscopy(HRTEM), grazing-incidence small-angle X-ray scattering (GISAXS) and X-ray refiectometry . Unlike HRTEM, which extracts information of a submicron region of the sample and only a few thousand particles are observed, GISAXS signal is obtained through an average over orders of magnitude larger number of particles (perhaps 10~(12) particles) distributed over an area of tens of square millimeters. This fact means that GISAXS sampling is much more representative of the sample as whole.Finally, multilayers were grown inside a Fabry-Perot cavity. The complete system operates as an optical switching device for the infrared region. The device was characterized by Scanning Electron Microscopy and optical absorption.
机译：在这项工作中，我们报告了通过交替使用激光烧蚀和等离子增强化学气相沉积技术制造嵌入SiO_2的PbTe量子点多层。通过在高纯氩气氛中使用Q开关Quantel Nd：YAG激光器的二次谐波，通过PbTe靶的脉冲激光沉积（PLD）来生长量子点。使用四甲氧基硅烷（TMOS）作为前体通过PECVD制备玻璃基体。射频功率由工作在13.56 MHz的RF-150 TOKYO Hi-Power提供，并通过匹配盒耦合到RF电极。纳米颗粒和玻璃基体的沉积速率以及最佳生长参数均来自先前的工作。通过高分辨透射电子显微镜（HRTEM），掠入射小角X射线散射（GISAXS）和X射线反射光度法研究了纳米结构材料的形貌特性。与HRTEM不同，HRTEM提取样品的亚微米区域的信息，仅观察到几千个粒子，而GISAXS信号是通过平均分布在一个区域上的较大数量的粒子（可能是10〜（12）个粒子）获得的。几十平方毫米。这个事实意味着GISAXS采样更能代表整个样本。最后，在Fabry-Perot腔内生长了多层。整个系统用作红外区域的光学开关设备。该装置通过扫描电子显微镜和光学吸收来表征。

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