Pattern transfer from the e-beam resist, over the nanoimprint resist and to the final silicon substrate

机译：从电子束抗蚀剂到纳米压印抗蚀剂的图案转移到最终的硅基板

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We developed Fluor-based RIE processes to fabricate nanoimprint template in silicon and to transfer patterns from theimprint resist to the silicon substrate. The etched silicon patterns have slightly tapered and smooth sidewalls. Thesidewall angle can be

机译：我们开发了基于氟的RIE工艺，以在硅中制造纳米压印模板，并将图案从压印抗蚀剂转移到硅基板上。蚀刻的硅图案具有略微锥形和光滑的侧壁。侧壁角度可以是

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来源
《Advanced etch technology for nanopatterning.》|2012年|P.OS.1-OS.8|共8页
会议地点 San Jose CA(US);San Jose CA(US)
作者
Jian He;
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作者单位

GeSiM Gesellschaft fuer Silizium-Mikrosysteme mbH (Germany) and Technical Univ. Dresden (Germany);

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会议组织
原文格式 PDF
正文语种 eng
中图分类制造工艺;制造工艺;
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专利

1. Metal Patterning Process on Rigid and Flexible Substrates Using Nanoimprint Lithography and Resist Pattern Transfer Technique [J] . Ho Yong Jung, Kang-Soo Han, Jong Hwa Lee, Journal of nanoscience and nanotechnology . 2009,第7期

机译：使用纳米压印光刻和抗蚀剂图案转移技术在刚性和柔性基板上进行金属图案化工艺
2. Metal Patterning Process on Rigid and Flexible Substrates Using Nanoimprint Lithography and Resist Pattern Transfer Technique [J] . Ho Yong Jung, Kang-Soo Han, Jong Hwa Lee, Journal of nanoscience and nanotechnology . 2009,第7期

机译：使用纳米压印光刻和抗蚀剂图案转移技术在刚性和柔性基板上进行金属图案化工艺
3. Improvement of the Non-Uniform Resist Patterns in the Thermal Nanoimprint Process Using Si Stamp with Nanoscale Rod Patterns [J] . YoungJa Kim, HwanSoo Jang, SooYeon Park, Journal of nanoscience and nanotechnology . 2011,第1期

机译：使用具有纳米级棒状图案的Si压模改善热纳米压印过程中非均匀抗蚀图案的性能
4. Terahertz wire-grid polarizer by nanoimprinting lithography on high resistivity silicon substrate [C] . Zhang L., Teng J. H., Tanoto H., 35th International Conference on Infrared Millimeter and Terahertz Waves . 2010

机译：在高电阻率硅衬底上通过纳米压印光刻技术实现太赫兹线栅偏振器
5. Novel Uses of Directly Patternable Silicon Oxide Based Resist for Advanced Patterning Applications. [D] . Desai, Vishal. 2017

机译：可直接图案化的基于氧化硅的抗蚀剂在高级图案化应用中的新用途。
6. Selective patterning of ZnO nanorods on silicon substrates using nanoimprint lithography [O] . Mi-Hee Jung, Hyoyoung Lee 2011

机译：使用纳米压印光刻技术在硅基板上选择性图案化ZnO纳米棒
7. Pattern Size Trimming by UV Exposure for Resist Patterns Fabricated by Thermal Nanoimprint Lithography [O] . Hayato Noma, Hiroaki Kawata, Masaaki Yasuda, 2013

机译：通过紫外线印刷光刻制造的抗蚀剂图案的紫外线曝光图案尺寸修剪

Pattern transfer from the e-beam resist, over the nanoimprint resist and to the final silicon substrate

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