Present status of upgraded long trace profiler for characterization of high-precision X-ray mirrors at SPring-8

著录项

• 来源
  《Advances in metrology for x-ray and EUV optics III》|2010年|p.780104.1-780104.9|共9页
• 会议地点 San Diego CA(US)
• 作者

  Y. Senba; H. Kishimoto; H. Ohashi; H. Yumoto; S. Goto; et al;

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• 作者单位

  Japan Synchrotron Radiation Research Institute, 1-1-1 Koto, Sayo, Hyogo, Japan 679-5198;

  Japan Synchrotron Radiation Research Institute, 1-1-1 Koto, Sayo, Hyogo, Japan 679-5198;

  Japan Synchrotron Radiation Research Institute, 1-1-1 Koto, Sayo, Hyogo, Japan 679-5198;

  Japan Synchrotron Radiation Research Institute, 1-1-1 Koto, Sayo, Hyogo, Japan 679-5198;

  Japan Synchrotron Radiation Research Institute, 1-1-1 Koto, Sayo, Hyogo, Japan 679-5198;

  et al;

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• 会议组织
• 原文格式 PDF
• 正文语种 eng
• 中图分类 光学计量仪器;
• 关键词

  Long trace profiler; Surface profile measurement; Optical metrology; Stitching measurement; X-ray mirror; Synchrotron radiation;

  机译：长跟踪分析器；表面轮廓测量；光学计量；拼接测量； X射线镜;同步辐射;