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首页> 外文会议>Advances in X-ray analysis (ICDD2001) >A QUICK AND RELIABLE FUSION METHOD FOR SILICON AND FERROSILICON
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A QUICK AND RELIABLE FUSION METHOD FOR SILICON AND FERROSILICON

机译：硅和硅铁的快速可靠融合方法

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Making glass disks for XRF analysis of silicon and its alloys represents a major problem of sample preparation. The reaction between silicon and platinum quickly leads to major corrosion or even complete destruction of the crucible. The new approach presented by the author last year at DXC2000 [1] paved the way to a new generation of fusion methods that give surprising results. Based on the same approach, a short and efficient chemical treatment has been found to oxidize silicon easily and rapidly, directly in the platinum crucible at low temperature, followed by fusion of the oxides. Using this method, the fusion leads to high quality glass disks; the unusual high sample/flux ratio is particularly interesting in the analysis of trace elements. Features of the new technique are: no crucible corrosion; simplicity, ease and speed; unusual high sample/flux ratios; easy trace analysis and easy XRF calibration using synthetic standards. This method has been developed particularly for silicon and ferrosilicon, but it has also been successfully applied to many other metals.
机译：制作用于硅及其合金的XRF分析的玻璃盘是样品制备的主要问题。硅和铂之间的反应很快导致严重腐蚀，甚至完全破坏了坩埚。作者去年在DXC2000上提出的新方法[1]为产生令人惊讶结果的新一代融合方法铺平了道路。基于相同的方法，已经发现了一种短而有效的化学处理方法，可以直接在铂坩埚中在低温下轻松，快速地氧化硅，然后将其熔融。使用这种方法，熔化可以得到高质量的玻璃盘。在痕量元素分析中，异常高的样品/通量比特别有趣。新技术的特点是：无坩埚腐蚀；简单，方便和快捷；异常高的样品/通量比；使用合成标准品可轻松进行痕量分析和XRF校准。该方法特别针对硅和硅铁而开发，但也已成功应用于许多其他金属。

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