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首页> 外文会议>Advances in Resist Technology and Processing XXIII pt.1 >Materials and Process Parameters on ArF Immersion Defectivity Study
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Materials and Process Parameters on ArF Immersion Defectivity Study

机译：ArF浸没缺陷研究的材料和工艺参数

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摘要

The immersion-specific watermark defect is discussed in its formation mechanism and in the influence of materials and exposure process. The non-topcoat approach was the basis of the work, where the properties of resist surface itself played the key role. Water droplets left on the resist surface were considered to induce the watermark defect in two possible ways; (1) the droplet is carried over to PEB process and impact the resist properties under the heat, (2) the droplet already evaporates before the PEB leaving some residue on the surface. A notable reduction in the resist dissolution rate was observed in the former case, which could be due to either physical or chemical change in the resist materials triggered by the water, and thereby would result in an unavoidable patterning failure. Therefore it is essential not to leave any water droplets on the surface in preventing the watermark formation. A very much hydrophobic materials design was proven effective in achieving this. The watermark formation was correlated to the scanning speed of immersion showerhead and the defectivity was evaluated in this perspective. The receding contact angle of the resist surface was found to well correlate to the "allowable" scanning speed, and was concluded that the higher was the better. A resist material was newly designed by using a hydrophobic polymer on this basis and the resist demonstrated a promising results not only in the watermark defectivity but also in lithographic performance.
机译：讨论了浸没特定水印缺陷的形成机理以及受材料和曝光过程的影响。非面漆方法是这项工作的基础，其中抗蚀剂表面本身的属性起着关键作用。认为残留在抗蚀剂表面的水滴有两种可能的方式引起水印缺陷： （1）液滴被带到PEB工艺中，并在加热下影响抗蚀剂性能；（2）液滴在PEB之前已经蒸发，在表面上留下一些残留物。在前一种情况下观察到抗蚀剂溶解速率显着降低，这可能是由于水引发的抗蚀剂材料的物理或化学变化，从而将导致不可避免的图案化失败。因此，为防止形成水印，必须在表面上不留任何水滴。事实证明，非常疏水的材料设计可以有效地实现这一目标。水印的形成与浸入式淋浴喷头的扫描速度相关，并从这个角度评估了缺陷性。发现抗蚀剂表面的后退接触角与“允许的”扫描速度高度相关，并且得出结论，越高越好。在此基础上，通过使用疏水性聚合物重新设计了抗蚀剂材料，该抗蚀剂不仅在水印缺陷率方面而且在光刻性能方面均显示出令人鼓舞的结果。

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