Synthesis of Boron Carbonitride Films by Plasma-based Ion Implantation

机译：等离子体基离子注入合成碳氮化硼薄膜

获取原文

获取原文并翻译 | 示例

页面导航

摘要
著录项
相似文献
相关主题

摘要

BCN films were prepared with unbalanced magnetron sputtering boron carbide film followed by nitrogen plasma-based ion implantation at different voltages on Si substrate. The implantation voltages vary from 10 kV to 50 kV. The chemical states of B, C and N of the films were studied with X-ray photoelectron spectroscopy (XPS) and Fourier transform infrared spectroscopy (FTIR). The nano-hardness and elastic modulus of films were measured by Nano-Indenter. The results showed that amorphous BCN films formed in the nitrogen implanted layer. The amorphous peak becomes obvious with increasing of the implanted voltage when the voltage is under of 40 kV. The Nano-Indenter measurement showed that the B-C bond content and the disorder degree affect the hardness and modulus.

机译：先用不平衡磁控溅射碳化硼膜制备BCN膜，然后在硅衬底上以不同电压进行基于氮等离子体的离子注入。注入电压从10 kV到50 kV不等。用X射线光电子能谱（XPS）和傅里叶变换红外光谱（FTIR）研究了薄膜中B，C和N的化学态。薄膜的纳米硬度和弹性模量通过Nano-Indenter测量。结果表明，在氮注入层中形成了非晶态的BCN膜。当电压低于40 kV时，非晶态峰随注入电压的增加而变得明显。纳米压头测量表明，B-C键含量和无序度会影响硬度和模量。

著录项

来源
《Asian Pacific Conference on Fracture and Strength;APCFS; 20061122-25;20061122-25; Sanya(CN);Sanya(CN)》|2006年|P.18501853|共2页
会议地点 Sanya(CN);Sanya(CN)
作者
Shuyan XU; Xinxin MA; Mingren SUN;
展开▼
作者单位

School of Materials Science and Engineering, Harbin Institute of Technology, Harbin 150001, China;

展开▼
会议组织
原文格式 PDF
正文语种 eng
中图分类机械试验法;
关键词
BCN; plasma-based ion implantation mixing; chemical state; mechanical properties;

机译：BCN;基于等离子体的离子注入混合;化学状态;力学性能;

相似文献

外文文献
中文文献
专利

1. Synthesis of Boron Carbonitride Films by Plasma-based Ion Implantation [J] . Shuyan XU, Xinxin MA, Mingren SUN Key Engineering Materials . 2007,第Pt3期

机译：等离子体基离子注入合成碳氮化硼薄膜
2. Synthesis of boron carbonitride (BCN) films by plasma-enhanced chemical vapor deposition using trimethylamine borane as a molecular precursor [J] . Kida Tetsuya, Shigezumi Kazunari, Mannan Md. Abdul, Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology . 2009,第8期

机译：以三甲胺硼烷为分子前驱体，通过等离子体化学气相沉积法合成碳氮化硼（BCN）膜
3. Synthesis and characterization of carbon nanoparticle films prepared by plasma-based ion implantation [J] . Shu Sawai, Yuya Nakahara, Naohiro Matsumoto, Surface and Interface Analysis: SIA: An International Journal Devoted to the Development and Application of Techniques for the Analysis of Surfaces, Interfaces and Thin Films . 2014,第10a11期

机译：等离子体离子注入制备的碳纳米颗粒薄膜的合成与表征
4. Synthesis of Boron Carbonitride Films by Plasma-based Ion Implantation [C] . Shuyan XU, Xinxin MA, Mingren SUN Asian Pacific Conference on Fracture and Strength . 2007

机译：基于等离子体的离子注入合成硼碳氮化物膜
5. Synthesis and characterization of titanium carbide, titanium boron carbonitride, titanium boride/titanium carbide and titanium carbide/chromium carbide multilayer coatings by reactive and ion beam assisted, electron beam-physical vapor deposition (EB-PVD). [D] . Wolfe, Douglas Edward. 2001

机译：通过反应和离子束辅助，电子束物理气相沉积（EB-PVD）合成和表征碳化钛，碳氮化钛硼，硼化钛/碳化钛和碳化钛/碳化铬多层涂层。
6. Green Synthesis of Boron Carbonitride with High Capacitance [O] . Dongping Chen, Yanzhen Huang, Xinling Hu, 2018

机译：高容量绿色合成碳氮化硼
7. Compilation on Synthesis, Characterization and Properties of Silicon and Boron Carbonitride Films [O] . P. Hoffmann, N. Fainer, M. Kosinova, 2011

机译：硅和硼碳氮化膜的合成，表征和性质的汇编

Synthesis of Boron Carbonitride Films by Plasma-based Ion Implantation

摘要

著录项

相似文献

相关主题

期刊订阅