Heteroleptic Precursors for Atomic Layer Deposition

著录项

• 来源
  《Atomic layer deposition applications 10》|2014年|221-232|共12页
• 会议地点 Cancun(MX)
• 作者

  J. Niinistoe; T. Blanquart; S. Seppaelae; M. Ritala; M. Leskelae;

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• 作者单位

  Laboratory of Inorganic Chemistry, Department of Chemistry, University of Helsinki P.O. Box 55, FI-00014 Helsinki, Finland;

  Laboratory of Inorganic Chemistry, Department of Chemistry, University of Helsinki P.O. Box 55, FI-00014 Helsinki, Finland;

  Laboratory of Inorganic Chemistry, Department of Chemistry, University of Helsinki P.O. Box 55, FI-00014 Helsinki, Finland;

  Laboratory of Inorganic Chemistry, Department of Chemistry, University of Helsinki P.O. Box 55, FI-00014 Helsinki, Finland;

  Laboratory of Inorganic Chemistry, Department of Chemistry, University of Helsinki P.O. Box 55, FI-00014 Helsinki, Finland;

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• 会议组织
• 原文格式 PDF
• 正文语种 eng
• 中图分类
• 关键词