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Resist materials design to improve sensitivity in EUV lithography

机译:抵抗材料设计以提高EUV光刻的灵敏度

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摘要

Polymer ionization and reductive sensitization of PAG play an important role for acid generation in EUV lithography. We have systematically investigated effects of PAG structure, polymer structure and their loadings on sensitivity of EUV resists. With an increase in PAG loading, both sensitivity and acid generation yield were successfully improved, however, these were saturated at higher PAG loadings. Least-square fitting of sensitivity as a function of PAG loading, polymer loading and quencher loading indicates that both PAG and polymer have a positive effect on sensitivity improvement, and contribution ratio of polymer to PAG on sensitivity is estimated as 1 to 2. This indicates that decrease of polymer loading in place of increasing PAG loading reduce ionization frequency of polymer. To further improve sensitivity, we have synthesized a series of PAGs to clarify how large the electron affinity of PAG affects acid generation yield. A linear relationship between the reduction potential of PAG and EB sensitivity clearly revealed that the strong electron affinity of PAG causes both high acid yield and sensitivity. To further increase acid generation yield, we have synthesized a series of polymers to clarify how polymer structure affects sensitivity. Actually, acid generation yield and sensitivity were both improved by using a newly developed polymer in EUV lithography.
机译:PAG的聚合物电离和还原敏化在EUV光刻中对酸的产生起重要作用。我们已经系统地研究了PAG结构,聚合物结构及其负载对EUV抗蚀剂感光度的影响。随着PAG负载的增加,灵敏度和产酸率都得到了成功的提高,但是,在更高的PAG负载下,它们已饱和。灵敏度的最小二乘拟合与PAG加载量,聚合物加载量和淬灭剂加载量的关系表明,PAG和聚合物都对提高灵敏度有积极作用,并且聚合物对PAG的敏感性贡献比估计为1-2。这表明降低聚合物负荷来代替增加PAG负荷会降低聚合物的电离频率。为了进一步提高灵敏度,我们合成了一系列PAG,以阐明PAG的电子亲和力对产酸量的影响。 PAG的还原电位与EB灵敏度之间的线性关系清楚地表明,PAG的强电子亲和力会导致高酸收率和灵敏度。为了进一步提高产酸率,我们合成了一系列聚合物以阐明聚合物结构如何影响灵敏度。实际上,通过在EUV光刻中使用新开发的聚合物,酸生成的产率和灵敏度均得到了改善。

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