首页> 外文会议>Conference on Design for Manufacturability through Design-Process Integration; 20080128-29; San Jose,CA(US) >System to Improve RET-OPC Production by Dynamic Design Coverage Using Sign-Off Litho Simulator
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System to Improve RET-OPC Production by Dynamic Design Coverage Using Sign-Off Litho Simulator

机译:通过签核光刻模拟器通过动态设计覆盖率提高RET-OPC生产的系统

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摘要

The advanced process technologies have well known yield loss due to the degradation of pattern fidelity. The process to compensate for this problem is advanced resolution enhancement techniques (RET) and optical proximity correction (OPC). By design, the creation of RET/OPC recipes and the calibration of process models are done very early in the process development cycle with data that are not made of real designs since they are not yet available, but made of test structures that represent different sizes, distances and topologies. The process of improving the RET/OPC recipes and models is long and tedious, it is usually a key contributor to quick production ramp-up. It is very coverage limited by design. The authors will present a proposed system that, by design, is dynamic, and allows the RET/OPC production system to reach maturity faster through a detailed collection of hotspots identified at the design stage. The goal is to reduce the lapse of time required to get mature production RET/OPC recipes and models.
机译:由于图案保真度的降低,先进的加工技术具有众所周知的产量损失。补偿此问题的过程是高级分辨率增强技术(RET)和光学邻近校正(OPC)。通过设计,可以在过程开发周期的早期就完成RET / OPC配方的创建和过程模型的校准,这些数据不是由真实设计构成的,因为它们尚不可用,而是由代表不同尺寸的测试结构构成的,距离和拓扑。改善RET / OPC配方和模型的过程漫长而乏味,这通常是快速提高产量的关键因素。它的覆盖范围非常受设计限制。作者将提出一个拟议的系统,该系统通过设计是动态的,并且可以通过在设计阶段确定详细的热点集合,使RET / OPC生产系统更快地达到成熟。目的是减少获得成熟的生产RET / OPC配方和模型所需的时间。

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