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首页> 外文会议>Conference on Emerging Lithographic Technologies Ⅴ Feb 27-Mar 1, 2001, Santa Clara, USA >Impact of positive ions and effect of lens aberrations in projection electron-beam systems
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Impact of positive ions and effect of lens aberrations in projection electron-beam systems

机译：投射电子束系统中正离子的影响和透镜像差的影响

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The Berkeley Electron Beam Simulator (BEBS) has been used with positive particles and induced lens aberrations to diagnose and partially compensate beam blur at high current Simulation shows up to a 24% spot size reduction at 30μA beam current with positive ions introduced in the beam column. Results also show that a proper amount of lens aberration can partially cancel the aberration induced by the global space charge effect. Over a 30% beam blur reduction has been achieved at 30μA beam current. A 30μA simulation requires roughly one hour with ten 500MHz processors. Results are also reported for using BEBS with both positrons and electrons as a stochastic effect simulator. This enables the isolation of the stochastic coulomb interactions from the space charge effect in any beam configuration and the direct measurement of the stochastic beam blur. Our simulation shows that the stochastic blur scales proportionally to I~(0.62), in comparison with Jansen's prediction of I~(0.67), where I is the beam current.
机译：伯克利电子束模拟器（BEBS）已与正粒子和感应透镜像差一起使用，以诊断和部分补偿高电流下的束模糊模拟显示在束流中引入正离子时，在30μA的束流下，束斑尺寸减小了24％ 。结果还表明，适量的镜头像差可以部分抵消整体空间电荷效应引起的像差。在束电流为30μA时，束流模糊降低了30％以上。十个500MHz处理器进行30μA仿真大约需要一个小时。还报道了将BEBS与正电子和电子一起用作随机效应模拟器的结果。这使得能够在任何光束配置中将随机库仑相互作用与空间电荷效应隔离开，并且可以直接测量随机光束模糊。我们的仿真表明，与Jansen对I〜（0.67）的预测（其中I是束流）相比，随机模糊与I〜（0.62）成比例。

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