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首页> 外文会议>Conference on Emerging Lithographic Technologies VIII pt.2; 20040224-20040226; Santa Clara,CA; US >Anisotropic EUV flare measured in the Engineering Test Stand (ETS)
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Anisotropic EUV flare measured in the Engineering Test Stand (ETS)

机译：在工程测试台（ETS）中测量的各向异性EUV耀斑

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摘要

We demonstrate direct flare measurements of the 4-mirror projection optics in the Engineering Test Strand (ETS). By using a conventional resist clearing method, also called the Kirk method, flare was directly measured in the ETS. Although flare has been verified to be constant across the field in our study, different flare values have been observed in different directions. The flare anisotropic variation makes flare compensation more complicated, and it may even result in non-uniform CD changes in different directions. In order to fully identify the directional flare variations of the projection optics in the ETS, a special flare measurement feature, a spoke pattern, has been created. The spoke pattern has been used to measure flare in azimuthal directions (every 15 degrees), and rigorously measured flare in all directions is presented in this study. Measured flare is highest in horizontal direction and lowest in vertical direction. The azimuthal flare variation is believed to be due to anisotropic mirror polishing. Measured flare in all directions qualitatively agrees with the polishing signatures of individual mirrors in the measured optics.
机译：我们在工程测试线（ETS）中演示了4镜投影光学系统的直接眩光测量。通过使用常规的抗蚀剂清除方法（也称为柯克方法），可在ETS中直接测量闪光。尽管在我们的研究中，耀斑在整个田间都被证明是恒定的，但是在不同方向观察到了不同的耀斑值。耀斑各向异性变化使耀斑补偿更加复杂，甚至可能导致不同方向上的CD变化不均匀。为了完全识别ETS中投影光学系统的方向性耀斑变化，已创建了特殊的耀斑测量功能，即辐条图案。辐条样式已用于测量方位角方向（每15度）的耀斑，并且在此研究中提出了严格测量的各个方向的耀斑。测得的耀斑在水平方向上最高，在垂直方向上最低。据信方位光斑变化是由于各向异性镜面抛光引起的。在所有方向上测得的耀斑在质量上与测得光学器件中单个反射镜的抛光特征一致。

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