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首页> 外文会议>Conference on Optical Microlithography XV Pt.2, Mar 5-8, 2002, Santa Clara, USA >Effect of Aberrations on Defect Printing and Inspection
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Effect of Aberrations on Defect Printing and Inspection

机译：像差对缺陷印刷和检查的影响

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摘要

As we introduce alternating phase-shifting masks (altPSM) to production we have been very aware of our inability to detect quartz defects in the phase-shifted well. Much work has been completed to establish the printability of various defects. This paper will show, using rigorous three dimensional electro-magnetic simulation, that it is the effect upon the aerial image of the surrounding features and the resultant CD variation that is most critical, not the actual printing of the defects. Data will be presented showing that smaller defects in the centre of the shifted space than at the edge of the space cause the allowable CD variation to be reached. It will also be shown that the most sensitive position for a quartz defect in a shifted space is not at the edge or centre of the space, but rather at a point between these two. We will further present work showing that asymmetrical aberrations enhance the effects of these defects, especially at defocus, while symmetric aberrations reduce the effect. We will then use advanced techniques, that take into account the extra non-planar incident waves we must consider in 1X imaging, to establish how these defects are 'seen' by 1X actinic mask inspection systems. In 1X imaging we will show again how the transmitted aerial images of these defects are effected by the aberrations present.
机译：当我们在生产中引入交替相移掩模（altPSM）时，我们已经非常意识到我们无法检测到相移井中的石英缺陷。建立各种缺陷的可印刷性的许多工作已经完成。本文将使用严格的三维电磁模拟显示最关键的是对周围特征的航拍图像和所产生的CD变化的影响，而不是缺陷的实际印刷。将提供数据，表明位移空间中心的缺陷比间隙边缘的缺陷小，可以达到允许的CD变化。还将显示出，在移位的空间中石英缺陷的最敏感位置不是在空间的边缘或中心，而是在这两者之间的一点。我们将进一步提出工作，表明非对称像差会增强这些缺陷的影响，尤其是散焦时，而对称像差会降低这种影响。然后，我们将使用先进的技术，考虑到我们在1X成像中必须考虑的额外非平面入射波，来确定如何通过1X光化掩模检测系统“发现”这些缺陷。在1X成像中，我们将再次显示这些缺陷的透射航空图像如何受到当前像差的影响。

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