首页> 外文会议>Conference on Optical Microlithography XV Pt.2, Mar 5-8, 2002, Santa Clara, USA >In-Situ Measurements of VUV Optical Materials for F_2 Laser
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In-Situ Measurements of VUV Optical Materials for F_2 Laser

机译:用于F_2激光器的VUV光学材料的原位测量

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F_2 laser lithography (wavelength: 157nm) is a candidate of post-ArF excimer laser lithography. In order to test the characteristics of vacuum ultraviolet (VUV) materials for F_2 laser lithography, we developed an evaluation system consisting of a 1kHz F_2 laser, an in-situ real-time transmittance measurement unit and an in-situ VUV spectrophotometer. The precision of the real-time transmittance measurement is +/-0.5%. The precision of the VUV spectrophotometer measurement is +/-0.5% for scanned wavelengths (140-300nm) and +/-0.1% for a constant wavelength (at 157.6nm). Due to F_2 laser irradiation cleaning, the transmittance of uncoated calcium fluoride (CaF_2) substrates and of F_2 laser coatings at first rapidly and then gradually increased. Thereafter the transmittance remained constant. Results of the real-time transmittance and the VUV spectrophotometer measurement were almost identical. In addition, durability tests of CaF_2 substrates and of F_2 laser coatings were performed with a 4kHz F_2 laser for more than 10 billion pulses (Bpls). After the initial transmittance increase of CaF_2 substrates, no change in transmittance was observed during more than 10Bpls. In order to maintain the CaF_2 substrate transmittance, silicon compounds have to be removed from the purge gas and from the irradiation chamber where optical materials are placed. F_2 laser coating quality varied enormously between suppliers.
机译:F_2激光光刻(波长:157nm)是后ArF准分子激光光刻的候选材料。为了测试用于F_2激光光刻的真空紫外(VUV)材料的特性,我们开发了一种由1kHz F_2激光器,现场实时透射率测量单元和现场VUV分光光度计组成的评估系统。实时透射率测量的精度为+/- 0.5%。 VUV分光光度计的测量精度对于扫描波长(140-300nm)为+/- 0.5%,对于恒定波长(157.6nm)为+/- 0.1%。由于使用了F_2激光辐照清洗,未涂覆的氟化钙(CaF_2)基材和F_2激光涂层的透射率首先迅速然后逐渐增加。此后,透射率保持恒定。实时透射率和VUV分光光度计的测量结果几乎相同。另外,使用4kHz F_2激光器对CaF_2衬底和F_2激光涂层进行了超过100亿个脉冲(Bpls)的耐久性测试。在CaF_2底物的初始透射率增加之后,在超过10Bpls的时间内未观察到透射率的变化。为了保持CaF_2衬底的透射率,必须从吹扫气体和放置光学材料的辐照室中除去硅化合物。供应商之间的F_2激光镀膜质量差异很大。

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