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首页> 外文会议>Conference on Optical Microlithography XV Pt.2, Mar 5-8, 2002, Santa Clara, USA >Implementation of Phase Shift Focus Monitor with Modified Illumination
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Implementation of Phase Shift Focus Monitor with Modified Illumination

机译：具有改进照明的相移聚焦监控器的实现

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摘要

For the convenience of practical use of phase shift focus monitor (PSFM), which has been developed by T. Brunner, imaging characteristics of PSFM are investigated under modified illumination by optical image calculations and printing experiments. Although the mechanism of pattern shift with focus offset under modified illumination is different from that for conventional high coherent illumination, sufficient sensitivity for precise focus monitoring is predicted by optical image calculations. Also, it is revealed that reduction of NA, i.e., localizing illumination at the peripheral part of pupil is effective to obtain higher sensitivity. By experiments, predicted characteristics are observed and similar sensitivity to that in conventional high coherent illumination is confirmed both for annular and quadrupole illuminations.
机译：为了方便T.Brunner开发的相移聚焦监视器（PSFM）的实际使用，通过光学图像计算和打印实验研究了PSFM在改进照明条件下的成像特性。尽管在修正照明下具有焦点偏移的图案偏移机制与传统的高相干照明不同，但是通过光学图像计算可以预测出足够的灵敏度来进行精确的焦点监视。另外，还揭示出NA的减小，即，将光照射在瞳孔的外围部分是有效的以获得更高的灵敏度。通过实验，观察到了预测的特性，并且对于环形和四极照明均确认了与常规高相干照明相似的灵敏度。

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