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首页> 外文会议>Conference on Photomask and Next-Generation Lithography Mask Technology IX, Apr 23-25, 2002, Yokohama, Japan >Development of Reticle-Free Exposure Method with LCD Projection Image
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Development of Reticle-Free Exposure Method with LCD Projection Image

机译：LCD投影图像的无网版曝光方法的发展

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摘要

Liquid crystal display (LCD) in place of the conventional reticles for optical projection lithography is proposed, in order to minimize the turn-around-time and production cost. The transmittance ratio between the two modes of the LCD, such as transparent and opaque ones, is approximately a several dozen depending on the wave length of the light source. In this study the Nikon g-line stepper was modified to apply the LCD on its reticle stage. The minimum resolution of this proposal projection system is quite similar to the one of the conventional reticle method. The exposure time is approximately 10 times longer compared to the conventional method. It has been proven that the LCD has the potential to be replaced for the conventional reticles in the optical stepper lithography that is applicable for devices with relatively large fabrication rules and low production amount.
机译：为了最小化周转时间和生产成本，提出了液晶显示器（LCD）来代替用于光学投影光刻的传统掩模版。 LCD两种模式（例如透明模式和不透明模式）之间的透射比大约为几十，这取决于光源的波长。在这项研究中，尼康g线步进器经过修改，可以将LCD应用于标线片阶段。该提议投影系统的最小分辨率与传统的掩模版方法非常相似。与传统方法相比，曝光时间大约长10倍。已经证明，LCD有可能被光学步进光刻中的传统掩模版所取代，该传统掩模版适用于制造规则相对较大且生产量较低的设备。

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