Development of Reticle-Free Exposure Method with LCD Projection Image

机译：LCD投影图像的无掩颈曝光方法的研制

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Liquid crystal display (LCD) in place of the conventional reticles for optical projection lithography is proposed, in order to minimize the turn-around-time and production cost. The transmittance ratio between the two modes of the LCD, such as transparent and opaque ones, is approximately a several dozen depending on the wave length of the light source. In this study the Nikon g-line stepper was modified to apply the LCD on its reticle stage. The minimum resolution of this proposal projection system is quite similar to the one of the conventional reticle method. The exposure time is approximately 10 times longer compared to the conventional method. It has been proven that the LCD has the potential to be replaced for the conventional reticles in the optical stepper lithography that is applicable for devices with relatively large fabrication rules and low production amount.

机译：提出了液晶显示器（LCD）代替用于光学投影光刻的传统掩模性，以便最小化转弯时间和生产成本。 LCD的两种模式之间的透射率比，例如透明和不透明，取决于光源的波长约为几十个。在本研究中，修改了尼康G线步进器以将LCD施加在其掩模版阶段。该提案投影系统的最低分辨率与传统掩模版方法之一非常相似。与传统方法相比，曝光时间约为10倍。已经证明，LCD具有可替换光学步进光刻中的传统掩模的可能性，其适用于具有相对大的制造规则和低产量的装置。

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《Conference on photomask and next-generation lithography mask technology》|2002年||共8页
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作者
Kazumitu Nakamura; Hiroshi Kubota; Akira Nakada; Tsuneo Inokuchi; Kouji Kosaka;
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正文语种
中图分类光刻、掩膜;
关键词
optical lithography; stepper; g-line; liquid crystal display; reticle;

机译：光学光刻;步进;G线;液晶显示器;掩盖;

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Development of Reticle-Free Exposure Method with LCD Projection Image

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