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首页> 外文会议>Conference on Photomask and Next-Generation Lithography Mask Technology IX, Apr 23-25, 2002, Yokohama, Japan >Alternating Phase Shift Mask Inspection Using Multiple Simultaneous Illumination Techniques
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Alternating Phase Shift Mask Inspection Using Multiple Simultaneous Illumination Techniques

机译：使用多种同时照明技术的交替相移掩模检查

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摘要

This paper discusses the challenges to alternating phase shift mask defect inspection and new approaches for phase defect detection using multiple illumination methods in conjunction with defect detection algorithm modifications. Die-to-die inspection algorithms were developed for the KLA-Tencor 365UV-HR (APS algorithm) and TeraStar SLF27 (TeraPhase algorithm) inspection systems based upon the use of simultaneous transmitted and reflected light signals. The development of an AltPSM programmed test vehicle is described and defect sensitivity characterization results from programmed phase defect reticles are presented. A comparison of the two approaches used for the different inspection systems is discussed. A comparison of TeraPhase to transmitted light only results from a programmed phase defect test mask shows improved phase defect detection results.
机译：本文讨论了交替相移掩模缺陷检查的挑战以及使用多种照明方法结合缺陷检测算法修改进行相缺陷检测的新方法。基于同时传输和反射光信号的使用，为KLA-Tencor 365UV-HR（APS算法）和TeraStar SLF27（TeraPhase算法）检查系统开发了芯片对芯片检查算法。描述了AltPSM程序化测试车辆的开发，并给出了程序化相位缺陷标线的缺陷敏感性表征结果。讨论了用于不同检查系统的两种方法的比较。将TeraPhase与透射光的比较仅来自已编程的相位缺陷测试掩模，结果显示了改善的相位缺陷检测结果。

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