EPL Technology Development

机译：EPL技术开发

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The imaging concept of electron projection lithography (EPL) with a silicon stencil reticle is explained. A silicon membrane thickness of 1-2μm is suitable for the reticle. A scattering contrast of grater than 99% is expected. Nikon is developing EPL tool as EB stepper. Sub-field size is 0.25mm square and deflection length is 5mm on wafer. The wafer is exposed with a sub-field by sub-field basis by the deflection control of the electron beam. The basic system configuration of EB stepper is introduced. Examples of error budgets of CD variation and Overlay/Stitching accuracy for 65nm technology node are shown. The latest data of electron optics and vacuum compatible stages for EB Stepper are introduced. 70nm patterns are resolved in the entire sub-field. The status of infrastructure of technology related to EPL reticle and data post processing software are explained.

机译：解释了具有硅模版掩模版的电子投影光刻（EPL）的成像概念。掩模版的硅膜厚度为1-2μm。预期散射对比度会超过99％。尼康正在开发EPL工具作为EB步进器。子场尺寸为0.25mm见方，偏转长度为5mm。通过电子束的偏转控制，晶片以子场为单位被子场曝光。介绍了EB步进器的基本系统配置。显示了65纳米技术节点的CD变化和覆盖/拼接精度误差预算示例。介绍了EB步进器的电子光学和真空兼容平台的最新数据。 70nm图案可在整个子场中解析。解释了与EPL标线和数据后处理软件相关的技术基础设施的现状。

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来源
《Conference on Photomask and Next-Generation Lithography Mask Technology IX, Apr 23-25, 2002, Yokohama, Japan》|2002年|p.775-789|共15页
会议地点 Yokohama(JP)
作者
Kazuaki Suzuki;
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作者单位

IC Equipment Division, Precision Equipment Company, Nikon Corporation 201-9, Miizugahara, Kumagaya, Saitama 360-8559, Japan;

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会议组织
原文格式 PDF
正文语种 eng
中图分类无线电电子学、电信技术;
关键词
electron projection lithography (EPL); EPL reticle; stencil reticle; image blur; proximity effect correction; stitching; vacuum stage; error budget;

机译：电子投影光刻（EPL）； EPL光罩；模版图像模糊；邻近效应校正；拼接真空台错误预算;

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1. Development Status of EPL Technology [J] . Kazuaki Suzuki, Sumito Shimizu Journal of Photopolymer Science and Technology . 2002,第3期

机译：EPL技术的发展现状
2. Phytochemistry of Three Ecuadorian Lamiaceae: Lepechinia heteromorpha (Briq.) Epling, Lepechinia radula (Benth.) Epling and Lepechinia paniculata (Kunth) Epling [J] . Gianluca Gilardoni, Jorge Ramírez, Mayra Montalván, Plants . 2019,第1期

机译：三种厄瓜多尔唇形科的植物化学：异型白花蛇舌草（Elepechinia heteromorpha）（Berq。Epping），小叶白花蛇蝎Lepechinia radula（Benth。）Epling和Lepechinia paniculata（Kunth）
3. Essential Oils from Bolivia. VI. Lamiaceae: Lepechinia graveolens (Reg.) Epling, L. floribunda (Benth.) Epling, and L. meyeni (Walp.) Epling [J] . Javier Bernardo Lopez Arze, Guy Collin, Francois-Xavier Garneau Journal of Essential Oil Research . 2009,第1期

机译：来自玻利维亚的精油。 VI。唇形科：Lepechinia graveolens（Reg。）Epling，L。floribunda（Benth。）Epling和L. meyeni（Walp.Epling）
4. EPL Technology Development [C] . Kazuaki Suzuki Conference on photomask and next-generation lithography mask technology . 2002

机译：EPL技术开发
5. SYSTEMATIC STUDIES OF SALVIA L. SUBGENUS CALOSPHACE (BENTH.) BENTH. IN BENTH. & HOOK. SECTION FARINACEAE (EPLING) EPLING (LAMIACEAE). [D] . PETERSON, KATHLEEN MARGARET. 1978

机译：SALVIA L. Subgenus CALOSPHACE（Benth。）Beth的系统研究。在本底。＆HOOK。节FARINACEAE（EPLING）EPLING（LAMIACEAE）。
6. Phytochemistry of Three Ecuadorian Lamiaceae: Lepechinia heteromorpha (Briq.) Epling Lepechinia radula (Benth.) Epling and Lepechinia paniculata (Kunth) Epling [O] . Gianluca Gilardoni, Jorge Ramírez, Mayra Montalván, 2019

机译：三种厄瓜多尔唇形科的植物化学：异型白花蛇舌草（Bleq。Epping）小叶白花蛇舌草Leadchinia radula（Benth。）Epling和Lepechinia paniculata（Kunth）
7. Development Status of EPL Technology. [O] . Kazuaki Suzuki, Sumito Shimizu 2002

机译：EPL技术的发展现状。

EPL Technology Development

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