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首页> 外文会议>Conference Series no.182; International Symposium on the Science and Technology of Light Sources; 20040718-22; Toulouse(FR) >Screening Test of Quartz Glass for 172nm Excimer Lamps
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Screening Test of Quartz Glass for 172nm Excimer Lamps

机译：172nm准分子灯用石英玻璃的筛选试验

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摘要

In recent years, VUV radiation sources like incoherent excimer lamps have become useful tools for many industrial applications. One important example is the Xe_2~* lamp, a narrow band radiation source at 172nm, which has found applications in photochemical vapor deposition, UV curing, light etching and VUV/ozone cleaning. In an industrial environment a stable emission and assured lifetime of more than one thousand hours are required. These needs depend on an optimized filling gas mixture and an envelop material, typically quartz glass, without significant degradation and high initial transmission. Due to the high photon energy the SiO_2 network is broken up causing the generation of color centers and formation of internal mechanical stress which may lead to a mechanical failure of the lamp tube.
机译：近年来，VUV辐射源（如非相干准分子灯）已成为许多工业应用的有用工具。一个重要的例子是Xe_2〜*灯，它是一种172nm的窄带辐射源，已在光化学气相沉积，UV固化，光蚀刻和VUV /臭氧清洁中得到应用。在工业环境中，需要稳定的排放并确保超过一千小时的使用寿命。这些需求取决于优化的填充气体混合物和包封材料（通常为石英玻璃），而不会出现明显的降解和较高的初始透射率。由于高的光子能量，SiO_2网络破裂，导致色心的产生和内部机械应力的形成，这可能导致灯管发生机械故障。

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