首页> 外文会议>Conference on Superintense Light Fields and Ultrafast Processes; 20030630-20030704; St.Petersburg; RU >Emission Spectra of Laser-Produced Plasmas for EUV and soft x-ray Sources
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Emission Spectra of Laser-Produced Plasmas for EUV and soft x-ray Sources

机译:EUV和软X射线源的激光产生等离子体的发射光谱

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The plasma emission of tin, aluminum and cupper targets irradiated with laser intensities ranging from 10~(11) to 10~(16) W/cm~2 has been measured between 7 nm and 18 nm. A chirped pulse amplified Ti:Sapphire laser oscillating at 790 nm with either 100 fs or 300 ps pulse duration and a Nd:YAG laser oscillating at 1064 nm with 10 ns pulse duration (fwhm) have been used. The observed plasma emission was strongest for the 300 ps laser pulse irradiation, which might be due to the additional laser plasma heating during plasma formation.
机译:测得锡,铝和铜靶的等离子体发射在7 nm至18 nm之间,激光强度为10〜(11)至10〜(16)W / cm〜2。使用了pulse脉冲放大的Ti:Sapphire激光器,在790 nm处以100 fs或300 ps的脉冲持续时间振荡,以及使用Nd:YAG激光器在1064 nm处以10 ns的脉冲持续时间(fwhm)振荡。对于300 ps的激光脉冲辐照,观察到的等离子体发射最强,这可能是由于等离子体形成过程中额外的激光等离子体加热所致。

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