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首页> 外文会议>Damage to VUV, EUV, and X-ray optics IV; and EUV and X-ray optics: synergy between laboratory and space III >Multiple free electron laser pulse illumination of a carbon coated silicon substrate
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Multiple free electron laser pulse illumination of a carbon coated silicon substrate

机译：碳涂层硅衬底的多重自由电子激光脉冲照明

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摘要

The fourth generation of XUV-, soft x-ray- and x-ray-light sources, like the free electron lasers FLASH and FERMI@Elettra, leads to new seminal scientific findings and technical challenges. For the facilities the question of the beam transport is of utmost importance. To provide a good reflectivity over a large range of photon energies up to about 300 eV mostly carbon coated silicon mirrors illuminated under gracing incidence angle are mostly chosen. Thereby the coating for the mirrors must tolerate high light intensities at high photon energies and also high repetition rates. In the present experiment an amorphous carbon coated silicon substrate was illuminated at photon energies of 21 nm (58 eV) and an average pulse energy of ～27 µJ. The ellipsoidal spot size of 300 µm × 600 µm at FLASH leads to a fluence of 0.019 J/cm~2. The influence of multiple (100 - 20.000) light pulses to the coated surface is analyzed. Depending on the number of pulses a change in reflectivity is visible under a light microscope. Both an AFM profile and measurements with a profilometer yield no topological changes. The investigation of the illuminated spots with a microfocus Raman spectrometer shows a decrease of the carbon signal at higher pulse repetition rates.
机译：第四代XUV，软X射线和X射线光源，例如自由电子激光器FLASH和FERMI @ Elettra，带来了新的开创性科学发现和技术挑战。对于设施而言，光束传输的问题至关重要。为了在高达约300 eV的大范围光子能量范围内提供良好的反射率，大多数情况下选择了在渐近入射角下照亮的碳涂层硅镜。因此，用于镜子的涂层必须在高光子能量和高重复率下耐受高光强度。在本实验中，以21 nm（58 eV）的光子能量和〜27 µJ的平均脉冲能量照射非晶碳涂层的硅衬底。 FLASH处的椭圆形光斑尺寸为300 µm×600 µm，通量为0.019 J / cm〜2。分析了多个（100-20.000）光脉冲对涂层表面的影响。根据脉冲数，在光学显微镜下可见反射率的变化。原子力显微镜轮廓和轮廓仪测量均不会产生拓扑变化。用微焦点拉曼光谱仪对照明斑点的研究表明，在较高的脉冲重复频率下碳信号的减少。

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