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首页> 外文会议>Conference on damage to VUV, EUV, and X-ray optics IV >Multiple free electron laser pulse illumination of a carbon coated silicon substrate
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Multiple free electron laser pulse illumination of a carbon coated silicon substrate

机译：碳涂覆硅衬底的多个自由电子激光脉冲照射

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The fourth generation of XUV-, soft x-ray- and x-ray-light sources, like the free electron lasers FLASH and FERMI@Elettra, leads to new seminal scientific findings and technical challenges. For the facilities the question of the beam transport is of utmost importance. To provide a good reflectivity over a large range of photon energies up to about 300 eV mostly carbon coated silicon mirrors illuminated under gracing incidence angle are mostly chosen. Thereby the coating for the mirrors must tolerate high light intensities at high photon energies and also high repetition rates. In the present experiment an amorphous carbon coated silicon substrate was illuminated at photon energies of 21 nm (58 eV) and an average pulse energy of ～27 μJ. The ellipsoidal spot size of 300 μm × 600 μm at FLASH leads to a fluence of 0.019 J/cm~2. The influence of multiple (100 - 20.000) light pulses to the coated surface is analyzed. Depending on the number of pulses a change in reflectivity is visible under a light microscope. Both an AFM profile and measurements with a profilometer yield no topological changes. The investigation of the illuminated spots with a microfocus Raman spectrometer shows a decrease of the carbon signal at higher pulse repetition rates.
机译：第四代XUV - ，软X射线和X射线光源，如自由的电子激光器闪光灯和费米@ Elettra，导致新的开创性的科学结果和技术挑战。对于设施来说，光束运输的问题至关重要。为了在大范围的光子能量上提供良好的反射率，最高可达大约300eV，大多数是在称为易于发射角下照射的碳涂覆的硅镜主要被选中。由此，镜子的涂层必须在高光子能量和高重复率下耐受高光强度。在本实验中，在21nm（58eV）的光子能量下照射非晶碳涂覆的硅衬底，平均脉冲能量为约27μj。闪光灯处的300μm×600μm的椭圆光斑尺寸导致流量为0.019 J / cm〜2。分析了多个（100-20.000）光脉冲对涂覆表面的影响。取决于脉冲的数量，在光学显微镜下可见反射率的变化。 AFM型材和测量均具有轮廓仪的尺寸，不会产生拓扑变化。用微胶带拉曼光谱仪对照明斑点的研究表明，在较高的脉冲重复速率下碳信号的降低。

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