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Intrinsic Advantages of SOI Multiple-Gate MOSFET (MuGFET) for Low Power Applications

机译:SOI多栅极MOSFET(MuGFET)在低功耗应用中的内在优势

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摘要

MuGFET structure improves local transistor mismatch compared to planar bulk MOSFET. This enables further SRAM cell size reduction. GIDL current is well controlled even with a mid-gap metal gate. MuGFETs have low subthreshold leakage if L_g/W_(si) ratio is kept above 1.5. The advantage of MuGFET subthreshold leakage suppression is even more pronounced at higher temperatures. Furthermore MuGFETs are compatible with local strain techniques to improve carrier mobility. The aforementioned qualities, along with low manufacturing cost of single mid-band-gap metal gate, make MuGFET a good candidate to replace planar bulk MOSFET for Low-Power Applications.
机译:与平面体MOSFET相比,MuGFET结构改善了局部晶体管的失配。这样可以进一步减小SRAM单元的尺寸。即使使用中间间隙的金属栅极,也可以很好地控制GIDL电流。如果L_g / W_(si)比率保持在1.5以上,则MuGFET的亚阈值漏电流低。 MuGFET亚阈值泄漏抑制的优势在更高的温度下更加明显。此外,MuGFET与局部应变技术兼容,可提高载流子迁移率。前述质量以及单个中带隙金属栅极的低制造成本使MuGFET成为替代低功耗应用中的平面体MOSFET的理想选择。

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