Abstract: A discharge driven, dense plasma focus (DPF) in Neon has been developed at SRL as a point x-ray source for sub-micron lithography. This source is presently capable of delivering approximately 25 J/pulse of Neon K-shell x rays (8 - 14 angstrom) into 4 $pi steradians with an $APEQ 1.4% wall plug efficiency at a 20 Hz repetition rate. This corresponds to 500 W of average x- ray power. The discharge is produced by a capacitor bank circuit (8 kV, 1.8 kJ) that drives $APEQ 320 kA currents into the DPF load, with $APEQ 1 $mu@s rise-times. X rays are produced when a dense pinch of Neon is formed along the axis of the DPF electrodes. Four $MUL ten$+5$/ discharges using a cooled DPF head have been fired producing x rays. The variation in the measured x-ray output, over several 10$+4$/ shots, corresponds to a variation in the dose delivered to a resist 40 cm from the source, of less than 1%. Data showing the measurement of the x- ray output, size, dose delivered to a resist, spectra of the source output, novel beam line concepts, and potential lithographic applications are discussed. !9
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