Abstract: The HL-800D cell-projection e-beam lithography system was developed to meet the need for quarter-micron direct writing. It is the first commercially available cell projection system. Using the original HL-700 series concepts and Hitachi's more than 20 years of experience with HL-series manufacturing, most of the subsystems were redesigned. The HL-800D system has the following features for high-speed and accuracy: (1) a maximum beam size of 5 $mu@m square with a current density of 10 A/cm$+2$/ at 50 kV acceleration; (2) a high-speed and high-accuracy, three-stage electron-beam deflection-control system; and (3) a continuous writing method to help eliminate stage-overhead time. The throughput of this system typically exceeds ten to fifteen wafers per hour for a quarter-micron pattern, though the speed depends on the total number of shots per wafer. This paper briefly describes the HL-800D system, including its specifications, system performance data, and its potential for ULSI lithography. !9
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机译：摘要：开发了HL-800D细胞投射电子束光刻系统，以满足四分之一微米直接书写的需要。这是第一个可商购的细胞投射系统。利用最初的HL-700系列概念和日立在HL系列制造领域20多年的经验，对大多数子系统进行了重新设计。 HL-800D系统具有以下特点，可实现高速和高精度的测量：（1）在50 kV加速度下，最大光束尺寸为5μm@ m 2，最大电流密度为10 A / cm $ + 2 $ /； （2）高速，高精度的三级电子束偏转控制系统； （3）连续写法，以帮助消除阶段开销时间。对于四分之一微米的图案，该系统的生产率通常每小时超过十至十五个晶圆，尽管速度取决于每个晶圆的总注射数量。本文简要介绍了HL-800D系统，包括其规格，系统性能数据及其在ULSI光刻方面的潜力。 ！9
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