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Determining thin film thickness characterization using adaptive simulated annealing algorithm

机译:使用自适应模拟退火算法确定薄膜厚度特征

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Thin film is very important in many industries. To perform the functions for which they were designed, the films must have proper thickness, roughness and other characteristics. These characteristics must often be measured, both during and after fabrication. Optical methods used to determining the characteristics of films are usually preferred because they are accurate, nondestructive and require little or no sample preparing. This paper introduces a new method of determining the thickness of thin films using Adaptive Simulated Annealing (ASA) algorithm. Based on the theory of thin film calculating, it uses the spectral reflectance data with the incident light perpendicular to the sample surface over a range of wavelengths to calculate the thickness of thin film. ASA is selected as a global optimization algorithm to characterize the thickness of thin film because it is good at dealing with the multimodal and nonsmooth cost function and it can converge quickly and accurately. The thicknesses of four thin film systems are calculated out to testify the correctness and efficiency of the method and the results are satisfying.
机译:薄膜在许多行业中都很重要。为了执行其设计的功能,薄膜必须具有适当的厚度,粗糙度和其他特性。在制造期间和制造之后,必须经常测量这些特性。通常优选用于确定薄膜特性的光学方法,因为它们准确,无损并且几乎不需要样品制备。本文介绍了一种使用自适应模拟退火(ASA)算法确定薄膜厚度的新方法。基于薄膜计算理论,它使用光谱反射率数据,其中入射光垂直于样品表面在一定波长范围内入射,从而计算薄膜厚度。选择ASA作为表征薄膜厚度的全局优化算法,是因为它擅长处理多峰和不平滑的成本函数,并且可以快速准确地收敛。计算了四个薄膜系统的厚度,证明了该方法的正确性和有效性,结果令人满意。

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