Plasma-Enhanced Atomic Layer Deposition Of Al

机译：Al的等离子体增强原子层沉积

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nanotubes for water splitting application. The reactor geometry is an asymmetric capacitive coupled (CCP) radio frequency (13.56 MHz) discharge, and the pressure investigated was fixed at 1 mbar and the discharge power varied in the range of 10-200 W. The total reaction cycle number was fixed on 200 cycles and the process temperature at 100°. These are typical conditions for PEALD process

机译：用于水分解的纳米管。反应堆的几何形状是非对称电容耦合（CCP）射频（13.56 MHz）放电，所研究的压力固定为1 mbar，放电功率在10-200 W的范围内变化。总的反应循环数固定为200个循环，过程温度为100°。这些是PEALD工艺的典型条件

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《IEEE International Conference on Plasma Science》|2017年|1-1|共1页
会议地点 Atlantic City(US)
作者
Rachel C. Gonçalves; Anelise C.O.C. Doria; Jhonatan. S.B. Lima; Rodrigo S. Pessoa; Homero S. Maciel;
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作者单位

University of Vale do Paraíba/Laboratory of Nanotechnology and Plasmas Processes Av. Shishima Hifumi São José dos Campos SP 12244-000 Brazil;

University of Vale do Paraíba/Laboratory of Nanotechnology and Plasmas Processes Av. Shishima Hifumi São Jo;

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Nanotubes; Plasmas; Aluminum oxide; Radio frequency; Atomic layer deposition; Temperature measurement;

机译：纳米管;血浆;氧化铝无线电频率;原子层沉积；温度测量;

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Plasma-Enhanced Atomic Layer Deposition Of Al

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