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Parametric Investigation of Laser-Assisted Direct Imprint (LADI) Technique

机译:激光辅助直接压印(LADI)技术的参数研究

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Nano-imprinting Lithography (NIL) has been considered as the most promising technique for nano-scaled fabrication and patterning. Recently, a new approach known as Laser-Assisted Direct Imprinting(LADI) has been proposed and demonstrated as an even more efficient way for direct nanofabrication and nanopatterning. In this study, we focused on silicon materials and utilized a single KrF excimer laser pulse (248 nm wavelength and 30 ns pulse duration) as the heating source. Molds of micro-scaled size have been prepared using conventional photolithography techniques. A working platform based on an Excimer Laser Micro-Machining system is constructed for LADI process. The influence of laser fluence and the imprinted pressure on the resulting structures was verifying by varying the laser fluence (1.0 ~ 1.2 J/cm~2) and the imprinted load (3 ~ 9kg). The results have shown that the morphology and the imprinted depth were directly related to the laser fluence and the imprinted pressure. Quantitative data are obtained and will be addressed.
机译:纳米压印光刻(NIL)被认为是用于纳米级制造和图案化的最有前途的技术。最近,已经提出了一种称为激光辅助直接压印(LADI)的新方法,并被证明是用于直接纳米加工和纳米图案化的更有效方法。在这项研究中,我们专注于硅材料,并利用单个KrF准分子激光脉冲(波长为248 nm,脉冲持续时间为30 ns)作为加热源。使用常规的光刻技术已经制备了微尺寸的模具。针对LADI工艺,构建了基于准分子激光微加工系统的工作平台。通过改变激光能量密度(1.0〜1.2 J / cm〜2)和压印载荷(3〜9kg)来验证激光能量密度和压印压力对结构的影响。结果表明,形貌和压印深度与激光通量和压印压力直接相关。获得了定量数据并将加以处理。

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