首页> 外文会议>International Conference on Nitride Semiconductors(ICNS-5); 20030525-20030530; Nara; JP >Co-implantation of Mn + N into p-type GaN for high T_C ferromagnetism
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Co-implantation of Mn + N into p-type GaN for high T_C ferromagnetism

机译:Mn + N共注入p型GaN中以实现高T_C铁磁性

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N and Mn ions were co-implanted into p-type GaN and subsequently annealed at 700-900 ℃. The ferromagnetic property was obtained after annealing at 800 ℃. As compared with conventional Mn-implanted samples, Mn-N binary phases significantly decreased, resulting in the reduction of the N vacancies. From synchrotron radiation photoemission spectroscopy, the Ga-Mn magnetic phases, which contributed to the ferromagnetic property, were still observed after annealing at 900 ℃. From these results, we propose the co-implantation of N and Mn atoms to achieve high T_C ferromagnetism in GaN.
机译:将N和Mn离子共注入p型GaN中,然后在700-900℃退火。在800℃退火后获得铁磁性能。与常规的Mn注入样品相比,Mn-N二元相显着减少,导致N空位的减少。同步辐射光电子能谱分析表明,在900℃退火后,仍能观察到有助于铁磁性能的Ga-Mn磁性相。根据这些结果,我们建议共注入N和Mn原子以在GaN中实现高T_C铁磁性。

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