Metallographic sample prepared by ion beam etching

机译：通过离子束蚀刻制备的金相样品

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Ion beam etching technique was used to reveal the metallograhpic microstructure and interface morphology of electroplating chromium coating, in particular, whose substrate surface layer was treated in advance by laser quenching. Chemical etchings were also conducted for comparison. The reveal microstructures were observed and analyzed by scanning electron microscopy. The results show that ion beam etching can reveal well the whole micro-structures of composite coating-substrate materials.

机译：采用离子束刻蚀技术揭示了镀铬层的金属组织和界面形态，特别是对基体表面层进行了激光淬火处理。还进行了化学蚀刻以进行比较。通过扫描电子显微镜观察并分析了揭示的微观结构。结果表明，离子束刻蚀可以很好地揭示复合涂层基体材料的整个微观结构。

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来源
《International Conference on Surface Engineering; 20041029-31; Shenzhen(CN)》|2004年|P.282-285|共4页
会议地点 Shenzhen(CN)
作者
XU Xiang-yang; ZHANG Kun; HAN Jian-min; CHEN Guang-nan;
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作者单位

Institute of Materials Science Engineering, Beijing Jiaotong University, Beijing 100044, China;

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会议组织
原文格式 PDF
正文语种 eng
中图分类材料腐蚀与保护;
关键词
ion beam etching; metallography; microstructure; electroplating; chromium;

机译：离子束蚀刻；金相；显微组织；电镀；铬;

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专利

1. Metallographic sample prepared by ion beam etching [J] . XU Xiang-yang, ZHANG Kun, HAN Jian-min, 中国有色金属学报（英文版） . 2004,第0z1期

机译：通过离子束蚀刻制备的金相样品
2. A study of the parameters for etching metallographical specimens in an RES 010 ion beam unit [J] . I. Graf Practical Metallography . 1999,第12期

机译：RES 010离子束装置腐蚀金相试样的参数研究。
3. Enhanced field electron emission from aligned diamond-like carbon nanorod arrays prepared by reactive ion beam etching [J] . Zhao Yong, Qin Shi-Qiao, Zhang Xue-Ao, Journal of Physics, D. Applied Physics: A Europhysics Journal . 2016,第19期

机译：通过反应性离子束刻蚀制备的对准的类金刚石碳纳米棒阵列增强的场电子发射
4. Metallographic sample prepared by ion beam etching [C] . XU Xiang-yang, ZHANG Kun, HAN Jian-min, International Conference on Surface Engineering . 2004

机译：通过离子束蚀刻制备的金相样品
5. Radical beam ion beam etching (RBIBE): Reactor characterization and etching of yttrium barium copper oxide thin film superconductors. [D] . Deshmukh, Shashank Chandrashekhar. 1993

机译：自由基离子束蚀刻（RBIBE）：钇钡氧化铜薄膜超导体的反应器表征和蚀刻。
6. Uniform hierarchical MFI nanosheets prepared via anisotropic etching for solution-based sub–100-nm-thick oriented MFI layer fabrication [O] . Yi Liu, Weili Qiang, Taotao Ji, 2020

机译：通过各向异性蚀刻制备的均匀分层MFI纳米片用于基于溶液的亚100纳米以下取向的MFI层制造
7. Photonic crystal cavity embedded barium strontium titanate thin-film rib waveguide prepared by focused ion beam etching [O] . Jim KL, Leung CW, Chan HLW 2010

机译：聚焦离子束刻蚀制备光子晶体腔嵌入钛酸锶锶钡薄膜肋形波导
8. Metallographic Methods, Etching for Bainitic Fine Carbides. A Metallographic Method for Revealing the Fine Carbides in Bainite Formed During Continuous Cooling in a Nickel-Chromium-Molybdenum Composition [R] . Reed, E. L., Carter, H. G. 1948

机译：金相方法，酸蚀贝氏体细小的碳化物。为揭示在贝氏体微细碳化物形成期间在镍 - 铬 - 钼组成连续冷却金相方法

Metallographic sample prepared by ion beam etching

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