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首页> 外文会议>International Symposium on Pits and Pores II: Formation, Properties, and Significance for Advanced Materials, Oct 22-27, 2000, Phoenix, AZ >EFFECT OF ANODIC OXIDE FILM STRUCTURE ON THE PREVENTION OF ELECTROLESS NI-P DEPOSITION ON A15052 ALLOY
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EFFECT OF ANODIC OXIDE FILM STRUCTURE ON THE PREVENTION OF ELECTROLESS NI-P DEPOSITION ON A15052 ALLOY

机译：阳极氧化膜结构对防止A15052合金化学镀Ni-P的影响

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摘要

This work is concerned with the effects of anodic oxide film structure, including defects and pores in the film and thickness of the film, on electroless Ni-P deposition on A15052 alloy. The unsealed anodic oxide film of A15052 alloy showed easier nucleation of Ni-P deposits and higher density of Ni-P nucleation site than that of pure aluminum, revealing the presence of defects in the film on A15052 alloy. The defects seem to be mainly voids generated by the dissolution of second-phase particles. Sealing treatment of anodic oxide films on A15052 alloy and pure aluminum, markedly reduced the number of Ni-P deposits. The number of Ni-P deposits was also reduced by the formation of thicker anodic oxide film on A15052 alloy. These results suggest that small size defects in anodic oxide films become readily inactive by sealing treatment and large size defects can be inactive by the formation of thicker anodic oxide film and sealing treatment.
机译：这项工作涉及阳极氧化膜结构（包括膜中的缺陷和孔以及膜的厚度）对A15052合金上化学镀Ni-P的影响。与纯铝相比，A15052合金的未密封阳极氧化膜显示出更易于Ni-P沉积的成核和更高密度的Ni-P成核位置，这表明A15052合金的膜中存在缺陷。缺陷似乎主要是由于第二相颗粒溶解而产生的空隙。在A15052合金和纯铝上进行阳极氧化膜的密封处理，显着减少了Ni-P沉积物的数量。通过在A15052合金上形成更厚的阳极氧化膜，还可以减少Ni-P沉积物的数量。这些结果表明，通过密封处理，阳极氧化膜中的小尺寸缺陷变得容易失活，并且通过形成更厚的阳极氧化膜和密封处理，大尺寸的缺陷会失活。

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