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STABILITY ENHANCEMENT OF MODIFIED POROUS SILICON NANOSTRUCTURES

机译:改性多孔硅纳米结构的稳定性增强

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The thermal reaction of undecylenic acid and ethyl undecylenate with a hydrogen-terminated porous silicon surface takes place at 95℃ to yield an organic monolayer covalently attached to the surface through Si-C bonds. The functional groups remain intact and are not affected by the chemical process. Under the same conditions, alcohols break the Si-Si back bonds of the PSi matrix. In contrast, the acid function does not react with either the Si-H or the Si-Si bonds of the PSi surface and the reaction takes place at the terminal C=C double bond of the molecule. When the reaction was carried out with decanoic acid, under the same conditions, the reaction was not complete. We have demonstrated that the derivatized surface with undecylenic acid can be activated by a simple chemical route using N-hydroxysuccimide in the presence of N-ethyl-N'-(3-dimethylaminopropyl) carbodiimide hydrochloride. The effect of the chemical process on the photoluminescence has been studied and the stability against corrosion in 100% humidity was studied using chemography. The functionalized surfaces have been characterized using transmission infrared and X-ray photoelectron spectroscopies.
机译:十一碳烯酸和十一碳烯酸乙酯与氢封端的多孔硅表面发生热反应,温度为95℃,产生通过Si-C键共价附于表面的有机单层。官能团保持完整,不受化学过程的影响。在相同条件下,醇会破坏PSi基质的Si-Si背键。相反,酸官能团既不与PSi表面的Si-H键也不与Si-Si键反应,并且该反应在分子的末端C = C双键处发生。当在相同条件下用癸酸进行反应时,反应没有完成。我们已经证明,在存在N-乙基-N′-(3-二甲基氨基丙基)碳二亚胺盐酸盐的情况下,可以使用N-羟基琥珀酰亚胺通过简单的化学路线活化用十一碳烯酸衍生的表面。研究了化学过程对光致发光的影响,并使用化学照相法研究了在100%湿度下的耐腐蚀稳定性。使用透射红外和X射线光电子能谱对功能化表面进行了表征。

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