Novel solution for in-line analysis of noble metallic impurities on silicon wafer surface

机译：在线分析硅片表面贵金属杂质的新解决方案

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摘要

In this paper, we introduce the composition of SNC solution and clarify the principles why SNC solution can be used to realize the in-line analysis of noble metallic impurities on the silicon wafer surface. We also show several recoveries of noble metals by analyzing the intentionally contaminated wafers.

机译：在本文中，我们介绍了SNC解决方案的组成，并阐明了为何可以使用SNC解决方案在线分析硅晶片表面上的贵金属杂质的原理。通过分析故意污染的晶圆，我们还显示出几种贵金属的回收率。

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来源
《Joint 2015 e-Manufacturing amp; Design Collaboration Symposium 2015 and 2015 International Symposium on Semiconductor Manufacturing》|2015年|1-4|共4页
会议地点 Taipei(CT)
作者
Jiahong Wu; Yamada Yuji; Shimazaki Ayako;
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作者单位

Semicond. Storage Products Co., Toshiba Corp., Yokkaichi, Japan;

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会议组织
原文格式 PDF
正文语种 eng
中图分类
关键词
elemental semiconductors; silicon; surface contamination; SNC solution; Si; in-line analysis; intentionally contaminated wafers; metallic impurities; noble metals; silicon wafer surface; Gold; Hafnium; Impurities; Silicon; Surface contamination; Surface treatment; ICP-MS; in-line analysis; noble metallic impurities; solution; wafer surface;

机译：元素半导体;硅;表面污染; SNC溶液;硅;在线分析;有意污染的晶片;金属杂质;贵金属;硅晶片表面;金; af;杂质;硅;表面污染;表面处理; ICP-MS;在线分析贵金属杂质溶液晶片表面;

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专利

1. Analysis of Low Metallic Contamination on Silicon Wafer Surfaces by Vapor-Phase Treatment and Total Reflection X-ray Fluorescence Analysis [J] . Ayako Shimazaki, Kunihiro Miyazaki, Tsuyoshi Matsumura, Japanese Journal of Applied Physics. Part 1, Regular Papers, Brief Communications & Review Papers . 2006,第12期

机译：气相处理和全反射X射线荧光分析法分析硅晶片表面的低金属污染
2. Total Reflection X-ray Fluorescence Spectroscopy Using Synchrotron Radiation for Trace Impurity Analysis of Silicon Wafer Surfaces [J] . Chang C.H., Koo Y.M. Metals and Materials . 1996,第1期

机译：使用同步辐射的全反射X射线荧光光谱法对硅晶片表面进行痕量杂质分析
3. Using ICP-MS for in-line monitoring of metallics in silicon wafer-cleaning baths [J] . Larry W. Shive, Kenneth Ruth, Philip Schmidt Micro . 1999,第2期

机译：使用ICP-MS在线监测硅片清洗槽中的金属
4. Novel solution for in-line analysis of noble metallic impurities on silicon wafer surface [C] . Jiahong Wu, Yamada Yuji, Shimazaki Ayako Joint 2015 e-Manufacturing Design Collaboration Symposium 2015 . 2015

机译：硅晶片表面上贵金属杂质在线分析的新溶液
5. Impact of Light Element Impurities (O, C and N) on the Mechanical Properties and Crack Initiation/Propagation in Photovoltaic Silicon Wafers. [D] . Shi, Meirong. 2012

机译：轻元素杂质（O，C和N）对光伏硅晶片的力学性能和裂纹萌生/传播的影响。
6. Growth and Self-Assembly of Silicon–Silicon Carbide Nanoparticles into Hybrid Worm-Like Nanostructures at the Silicon Wafer Surface [O] . Manuel Alejandro Perez-Guzman, Rebeca Ortega-Amaya, Yasuhiro Matsumoto, 2018

机译：碳化硅-碳化硅纳米粒子在硅晶片表面的生长和自组装成蠕虫状纳米杂化结构。
7. Analytical Chemistry represented by "super" and "ultra". Determination of the ultratrace metallic impurities distribution in silicon wafers by sub-area chemical etching/microflow neblizer-ICP-MS. [O] . Miyuki TAKENAKA, Yuji YAMADA, Motonaka YABUKI, 2001

机译：分析化学“超级”和“超”代表。亚区化学蚀刻/微射线NEBLIELER-ICP-MS测定硅晶片中硅晶片超速金属杂质分布。
8. Emission Spectrographic Determination of Metallic Impurities in Silicon Nitride by a Solution Method [R] . Ferraro, T. A., Strauss, B. H. 1973

机译：溶液法测定氮化硅中金属杂质的发射光谱

Novel solution for in-line analysis of noble metallic impurities on silicon wafer surface

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