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New versatile system for characterization of antireflective coatings using combined spectroscopic ellipsometry and grazing x-ray reflectance

机译:新型多功能系统,用于结合椭圆偏振光谱法和掠射X射线反射率表征抗反射涂层

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Abstract: Spectroscopic ellipsometry has long been recognized as a powerful technique for nondestructive characterization of thin films and multilayer structures. In the case of photolithography it has been intensively used for layer thickness and optical index determinations. Nevertheless, the main drawback of this technique is that it is not direct. The data analysis must be made adjusting a prior optical models on the experimental data. For photolithographic films, it is sometimes difficult to find accurate structural model and the analysis becomes difficult when the film is absorbent in the entire wavelength range. It is why SOPRA has developed recently a new versatile instrument that integrates different experimental techniques. The base is the SOPRA GESP5 instrument which offers already the possibility to perform spectroscopic ellipsometry, spectroscopic photometry and scatterometry. We have added a grazing x-ray reflectometer option, which allows measurements on the same spot at the same time, and combine analysis of the different data. The source is a compact ceramic Cu fine focus x-ray tube. the x-ray beam is defined by Soller Slits and a parallel interchangeable slits. After reflection on the sample surface, the beam is monochromatized using a curve graphite crystal and focused on the detector. This new system is discussed in details hereafter and characterization of antireflective for microlithography is presented. !15
机译:摘要:椭圆偏振光谱法一直以来被认为是一种无损表征薄膜和多层结构的强大技术。在光刻的情况下,其已被广泛用于层厚度和光学指数的确定。然而,该技术的主要缺点是它不是直接的。必须根据实验数据调整先前的光学模型进行数据分析。对于光刻胶片,有时很难找到准确的结构模型,而当胶片在整个波长范围内都具有吸收性时,分析就变得困难。这就是SOPRA最近开发出一种集成了不同实验技术的多功能仪器的原因。 SOPRA GESP5仪器是该仪器的基础,它已经提供了执行椭圆偏振光谱,光谱光度法和散射法的可能性。我们添加了放牧X射线反射仪选件,该选件可以在同一时间在同一地点进行测量,并结合对不同数据的分析。光源是紧凑的陶瓷Cu细焦点X射线管。 X射线束由Soller狭缝和平行的可互换狭缝限定。在样品表面反射后,使用弯曲的石墨晶体将光束单色化,并聚焦在检测器上。此后将详细讨论这个新系统,并介绍微光刻的抗反射特性。 !15

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